High-Quality ETL Made by Nanocolumns of TiO2 through DC Reactive Magnetron Sputtering in GLAD Configuration

Perla Yanet Rosales Medina; Elida Flores Sigala; Fernando Avelar Muñoz; Javier Alejandro Berumen Torres; José de Jesus Araiza Ibarra; Hugo Tototzintle Huitle; Víctor Hugo Méndez García; Jose Juan Ortega Sigala

doi:10.20944/preprints202306.1325.v1

A peer-reviewed article of this Preprint also exists.

Rosales Medina, P.Y.; Avelar Muñoz, F.; Flores Sigala, E.; Rosales, R.G.; Berumen Torres, J.A.; Araiza Ibarra, J.J.; Tototzintle Huitle, H.; Méndez García, V.H.; Ortega Sigala, J.J. Growth of Nanocolumnar TiO₂ Bilayer by Direct Current Reactive Magnetron Sputtering in Glancing-Angle Deposition Configuration for High-Quality Electron Transport Layer. Micromachines 2023, 14, 1483. Rosales Medina, P.Y.; Avelar Muñoz, F.; Flores Sigala, E.; Rosales, R.G.; Berumen Torres, J.A.; Araiza Ibarra, J.J.; Tototzintle Huitle, H.; Méndez García, V.H.; Ortega Sigala, J.J. Growth of Nanocolumnar TiO2 Bilayer by Direct Current Reactive Magnetron Sputtering in Glancing-Angle Deposition Configuration for High-Quality Electron Transport Layer. Micromachines 2023, 14, 1483.

Abstract

The electron Transport layer (ETL) plays a crucial role in solar cell technology, particularly in perovskite solar cells (PSCs), where nanostructured TiO2 films have been investigated as superior ETL’s compared to compact TiO2. In this study we explore the nanocolumnal growth of TiO2 in the anatase phase, for bilayer thin films by magnetron sputtering (MS) technique and glancing angle deposition (GLAD). By optimizing the growth parameters, we achieved the formation of TiO2 nanocolumns with a cross-sectional diameter ranging from 50 to 75 nm. The average thickness of the films exceeded 12.71 ± 0.5µm , while the filaments exhibited an inclination angle close to 70◦ , corresponding to the deposition angle. Furthermore, we observed a correlation between the quality of the initial layer and enhanced growth of the TiO2 nanocolumns.

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High-Quality ETL Made by Nanocolumns of TiO₂ through DC Reactive Magnetron Sputtering in GLAD Configuration

Abstract

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