Laser Patterned Alumina Mask and Mask-less Dry Etch of Si for Light Trapping

Jovan Maksimovic; Haoran Mu; Daniel Smith; Tomas Katkus; Mantas Vaičiulis; Ramūnas Aleksiejūnas; Gediminas Seniutinas; Soon Hock Ng; Saulius Juodkazis

doi:10.20944/preprints202212.0583.v1

Preprint Article Version 1 Preserved in Portico This version is not peer-reviewed

Version 1 : Received: 29 December 2022 / Approved: 30 December 2022 / Online: 30 December 2022 (10:14:28 CET)

Ultra-short 230 fs laser pulses of 515 nm wavelength were tightly focused into 700 nm focal spots and utilised in opening ~ 0.4 − 1 μm holes in alumina Al2O3 etch masks with 20-50 nm thickness. Such dielectric masks simplify fabrication of photonic crystal (PhC) light trapping patterns for the above-Lambertian performance of high efficiency solar cells. Conditions of laser ablation of transparent etch masks and effects sub-surface Si modifications were revealed by plasma etch- ing, numerical modeling, and minority carrier lifetime measurements. Mask-less patterning of Si is proposed using fs-laser direct writing for dry plasma etch of Si.

light trapping; Si solar cells; ablation; dry etch; Lambertian limit

Chemistry and Materials Science, Nanotechnology

Not displayed online.

Please leave your comment to this article below.

Mathematical equations can be typed in either LaTeX formats \\[ ... \\] or $$ ... $$, or MathML format <math> ... </math>. Try the LaTeX or MathML example.

Type equation:

Preview:

Copy equation into message below

Close menu

Please click a symbol to insert it into the message box below:

Please enter the link here:

Optionally, you can enter text that should appear as linked text:

Copy link into message below

Close menu

Please enter or paste the URL to the image here (please only use links to jpg/jpeg, png and gif images):

Copy image into message below

Close menu

Type author name or keywords to filter the list of references in this group (you can add a new citation under Bibliography):

No existing citations in Discussion Group

Wikify editor is a simple editor for wiki-style mark-up. It was written by MDPI for Sciforum in 2014. The rendering of the mark-up is based on Wiky.php with some tweaks. Rendering of mathematical equations is done with MathJax. Please send us a message for support or for reporting bugs.

Close menu

Please declare any conflicts of interest you may have with this paper, financial or otherwise.

I do not have a conflict of interest

I would like to declare a conflict of interest

Display my name on the website

Captcha

Renew

I accept the following conditions:

Comments must follow the standards of professional discourse and should focus on the scientific content of the article. Insulting or offensive language, personal attacks and off-topic remarks will not be permitted. Comments must be written in English. Preprints reserves the right to remove comments without notice. Readers who post comments are obliged to declare any competing interests, financial or otherwise.

* All users must log in before leaving a comment

Notify me about updates to this article or when a peer-reviewed version is published.

Laser Patterned Alumina Mask and Mask-less Dry Etch of Si for Light Trapping

Abstract

Keywords

Subject

Comments (0)