Submitted:
21 August 2025
Posted:
22 August 2025
You are already at the latest version
Abstract
Keywords:
1. Introduction
2. Materials and Methods
3. Results
3.1. Composition of the (AlFeCoNi)Cx HECFs
3.2. Microstructure of the (AlFeCoNi)Cx HECFs
3.3. Tribological Properties of the (AlFeCoNi)Cx HECFs
3.4. Corrosion Resistance of the (AlFeCoNi)Cx HECFs
4. Discussion
5. Conclusions
Author Contributions
Funding
Institutional Review Board Statement
Informed Consent Statement
Data Availability Statement
Conflicts of Interest
Abbreviations
| HECFs | High-entropy alloy carbide films |
| HEAFs | High-entropy alloy films |
| HPPMS | High power pulsed magnetron sputtering |
| EDS | Energy dispersive spectroscopy |
| XRD | X-ray diffraction |
| TEM | Transmission electron microscopy |
| FE-SEM | Field emission scanning electron microscope |
| EIS | Electrochemical impedance spectroscopy |
| APT | Atom probe tomography |
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| Process parameter | Values |
| Base pressure (Pa) | 1×10-3 |
| Working pressure (Pa) | 0.9 |
| HPPMS power (V-μs-Hz) | 800-150-200 |
| Argon flow (sccm) | 40 |
| Acetylene flow (sccm) | 0, 3, 5 |
| Deposition time (min) | 30 |
| Deposition temperature | Room temperature |
| Substrate bias voltage (V) | -50 |
| Substrate-target distance (mm) | 80 |
| Samples | 304 SS | 0 sccm | 3 sccm | 5 sccm |
| Ecorr (VSCE) | -0.004 | -0.222 | -0.045 | -0.004 |
| Icorr (A/cm2) | 1.23 E-07 | 1.62 E-06 | 4.03 E-07 | 7.16 E-08 |
|
Samples/ Parameter |
Rs (Ω·cm2) |
Rp (Ω·cm2) |
CPEp (sn·Ω-1·cm-2) |
Rct (Ω·cm2) |
CPEct (sn·Ω-1·cm-2) |
χ2 | ||
| 0 sccm | 5.3 | 1110 | 2.0×10-5 | 98399 | 1.01×10-5 | 0.0030 | ||
| 3 sccm | 5.4 | 1154 | 5.2×10-6 | 174170 | 1.1×10-5 | 0.0026 | ||
| 5 sccm | 4.9 | 1890 | 8.0×10-6 | 1834200 | 3.1×10-6 | 0.0589 | ||
| 304SS | 4.8 | - | - | 534500 | 1.1×10-4 | 0.0045 | ||
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