Preprint Article Version 1 Preserved in Portico This version is not peer-reviewed

The Effect of Microstructure of Molybdenum Target

Version 1 : Received: 24 January 2021 / Approved: 25 January 2021 / Online: 25 January 2021 (12:48:45 CET)

How to cite: An, G.; Sun, J. The Effect of Microstructure of Molybdenum Target . Preprints 2021, 2021010494 (doi: 10.20944/preprints202101.0494.v1). An, G.; Sun, J. The Effect of Microstructure of Molybdenum Target . Preprints 2021, 2021010494 (doi: 10.20944/preprints202101.0494.v1).

Abstract

Abstract: Molybdenum (Mo) thin films were sputtered from two kinds of Mo targets with different microstructures under the same sputtering process, and the effect of microstructure of Mo target on morphology, deposition rate and resistance of sputtered film were studied and discussed. The results show that morphological differences between Mo thin films sputtered by Mo targets with different microstructures are very small. The more uniform and finer the grain structures of Mo target, the better the uniformity on thickness and resistance of Mo sputtered film. Moreover, during sputtering process, when Mo target’s grain size is finer and the surface area of grain boundary is higher, the thickness reduction of the target is more homogeneous and the sputtering film has faster deposition velocity. The difference in microstructure of the Mo target has not obvious influence on the grain orientation of sputtering film.

Subject Areas

preparation; molybdenum target; sputtered film; microstructure; grain orientation

Comments (0)

We encourage comments and feedback from a broad range of readers. See criteria for comments and our diversity statement.

Leave a public comment
Send a private comment to the author(s)
Views 0
Downloads 0
Comments 0
Metrics 0


×
Alerts
Notify me about updates to this article or when a peer-reviewed version is published.
We use cookies on our website to ensure you get the best experience.
Read more about our cookies here.