Structural Origin of Magnetotransport Properties in APCVD Deposited Single and Bi-Layer Tin Oxide Thin Films

Tin oxide (SnO2) thin films, undoped single-layer and fluorine doped / undoped bilayer were deposited by Atmospheric Pressure Chemical Vapour Deposition (APCVD) at soda-lime glass substrate at two different temperatures (590°C and 610°C). Transport properties examined by impedance spectroscopy, DC resistivity, Hall effect and magnetoresistance measurements are correlated with structural properties examined by Scanning Electron Microscopy, Grazing Incidence X-ray Diffraction (GIXRD) and Time-of-flight Elastic Recoil Detection Analysis (TOF-ERDA). Results suggest that charge transport in the obtained samples is dominated by scattering at neutral impurities and can be correlated with preferred orientation (texture coefficient) presented in prepared samples.