Submitted:
01 May 2024
Posted:
02 May 2024
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Abstract
Keywords:
1. Introduction
2. Materials and Methods
2.1. Preparation of CpTi G4 Substrate
2.2. Electrochemical Oxidation of CpTi G4 Surface
2.3. Materials Characterization
2.4. Implementation and Release Kinetics of Gentamicin Sulfate from the Oxidized Surface of CpTi G4
2.5. Fourier Transform Infrared Spectroscopy Measurements
3. Results and Discussion
3.1. Electrochemical Characteristics of the Process of Creating Porous Oxide Layers on the Surface of Cp Ti G4
3.2. FE-SEM Characterization of the CpTi G4 Microstructure before and after the Electrochemical Oxidation Proces
3.3. EDS Study of Chemical Composition
3.4. Surface Roughness Study
3.4. Release Kinetics of Gentamicin Sulfate from Porous Oxide Layers on CpTi G4
5. Conclusions
Author Contributions
Funding
Data Availability Statement
Conflicts of Interest
References
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| CpTi G4 sample | Ra [µm] | Rz [µm] | Rq [µm] |
|---|---|---|---|
| Mechanically ground | 1.11(19) | 7.35(07) | 1.38(05) |
| Electrochemically polished | 0.50(01) | 3.71(01) | 0.66(02) |
| Anodized at 20 V for 2 hours | 2.08(01) | 14.76(06) | 2.70(05) |
| Anodized at 20 V for 18 hours | 2.27(01) | 13.99(02) | 2.80(01) |
| Anodized at 20 V for 24 hours | 2.49(08) | 16.92(02) | 3.12(09) |
| Anodized at 20 V for 48 hours | 2.54(05) | 15.32(01) | 3.11(08) |
| Anodizing time [h] |
Amount of gentamicin sulfate loaded [mg] |
|---|---|
| 2 | 58.6 |
| 12 | 51.9 |
| 24 | 46.3 |
| 48 | 44.2 |
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