Submitted:
07 February 2024
Posted:
07 February 2024
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Abstract
Keywords:
1. Introduction
2. MR Honing Polishing Process
2.1. Polishing Mechanism
2.2. Design of the Polishing Apparatus
2.3. Design and Simulation of the Magnetic Field
3. Experimental Methods
3.1. MR Polishing Fluid
3.2. Polishing Conditions
3.3. Experimental Design of the VMRP Process
3.4. Measurement of Surface Roughness and Removal Mass
4. Results and discussions
4.1. Test 1: Effect of the Polishing Time on the Polishing Performance
4.2. Test 2: Effect of the Particle Size on the Polishing Performance
4.3. Test 3: Effect of the Rotation Speed on the Polishing Performance
5. Conclusions
Author Contributions
Funding
Data Availability Statement
Conflicts of Interest
References
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| Constituents of MR polishing fluid | Concentration (%) |
|---|---|
| Carbonyl iron powder | 30 |
| Diamond powder | 10 |
| Glycerol | 8 |
| Deionized water | 52 |
| Parameter | Values |
|---|---|
| Polishing gap | 1 mm |
| Reciprocating stroke | 10 mm |
| Reciprocating linear speed | 7.5 cycles per minutes |
| Feeding speed | 2.5 mm/s |
| Rotation speed (rpm) | Size of CIP and polishing particles (μm) | Polishing time (cycles) | Revolutions (r) |
| 700 | 18 and 20 | 675 | 63000 |
| 1350 | 126000 | ||
| 2025 | 189000 | ||
| 2700 | 252000 |
| Rotation speed (rpm) | The polishing time under different sizes of particles (cycles) | Revolutions (r) | ||
| 18 μm and 20 μm | 10 μm and 10 μm | 5 μm and 5 μm | ||
| 700 | 225 | 225 | 225 | 63000 |
| 450 | 450 | 450 | 126000 | |
| 675 | 675 | 675 | 189000 | |
| 900 | 900 | 900 | 252000 | |
| CIP and polishing particles (μm) | The polishing time under different rotation speeds (cycles) | Revolutions (r) | |||
| 1120 rpm | 980 rpm | 840 rpm | 700 rpm | ||
| 18 and 20 | 105 | 120 | 140 | 169 | 63000 |
| 210 | 240 | 280 | 338 | 126000 | |
| 315 | 360 | 420 | 507 | 189000 | |
| 420 | 480 | 560 | 676 | 252000 | |
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