Preprint Article Version 1 Preserved in Portico This version is not peer-reviewed

Observation of Weibull, Lognormal, and Gamma Distributions in Electrodeposited Cu and Cu-Ag Particles

Version 1 : Received: 21 August 2023 / Approved: 22 August 2023 / Online: 23 August 2023 (05:42:21 CEST)

A peer-reviewed article of this Preprint also exists.

Sun, Y.; Zangari, G. Observation of Weibull, Lognormal, and Gamma Distributions in Electrodeposited Cu and Cu-Ag Particles. Materials 2023, 16, 6452. Sun, Y.; Zangari, G. Observation of Weibull, Lognormal, and Gamma Distributions in Electrodeposited Cu and Cu-Ag Particles. Materials 2023, 16, 6452.

Abstract

In this work, the nearest neighbor distances and Voronoi cell features of the Cu-Ag deposits were analyzed and fitted with Lognormal, Weibull, and Gamma distributions. The nearest neighbor distance distributions of the samples were compared with those of complete spatially random points, showing spatial inhomogenity due to the nucleation exclusion effect. The radial distribution function was calculated, showing both influences from the grain size and the nucleation exclusion effect. Voronoi cells were generated based on the shape of the grains. The size, occupancy, and coordination of the Voronoi cells were examined and fitted. The results show that despite the Cu-Ag deposits seem to be governed by instantaneous nucleation mode, the spatial distribution of the nuclei is more impacted by the nucleation exclusion effect than the Cu-only samples. This behavior is also justified by the grain size distribution generated with Voronoi cell size and occupancy distributions.

Keywords

Electrodeposition; Nucleation and growth; Particle statistics; Lognormal, Weibull, and Gamma distributions

Subject

Chemistry and Materials Science, Electrochemistry

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