PreprintReviewVersion 2Preserved in Portico This version is not peer-reviewed
Improvement of Algan Homoepitaxial Tunnel Junction Deep-UV Light-Emitting Diodes by Controlling the Growth of N-Type Algan and Polycrystalline Mgzno/Al Electrodes
Version 1
: Received: 10 February 2023 / Approved: 15 February 2023 / Online: 15 February 2023 (02:33:47 CET)
Version 2
: Received: 17 February 2023 / Approved: 17 February 2023 / Online: 17 February 2023 (07:14:52 CET)
How to cite:
Nagata, K.; Matsubara, T.; Saito, Y.; Kataoka, K.; Narita, T.; Horibuchi, K.; Kushimoto, M.; Tomai, S.; Katsumata, S.; Honda, Y.; Takeuchi, T.; Amano, H. Improvement of Algan Homoepitaxial Tunnel Junction Deep-UV Light-Emitting Diodes by Controlling the Growth of N-Type Algan and Polycrystalline Mgzno/Al Electrodes. Preprints2023, 2023020249. https://doi.org/10.20944/preprints202302.0249.v2.
Nagata, K.; Matsubara, T.; Saito, Y.; Kataoka, K.; Narita, T.; Horibuchi, K.; Kushimoto, M.; Tomai, S.; Katsumata, S.; Honda, Y.; Takeuchi, T.; Amano, H. Improvement of Algan Homoepitaxial Tunnel Junction Deep-UV Light-Emitting Diodes by Controlling the Growth of N-Type Algan and Polycrystalline Mgzno/Al Electrodes. Preprints 2023, 2023020249. https://doi.org/10.20944/preprints202302.0249.v2.
Cite as:
Nagata, K.; Matsubara, T.; Saito, Y.; Kataoka, K.; Narita, T.; Horibuchi, K.; Kushimoto, M.; Tomai, S.; Katsumata, S.; Honda, Y.; Takeuchi, T.; Amano, H. Improvement of Algan Homoepitaxial Tunnel Junction Deep-UV Light-Emitting Diodes by Controlling the Growth of N-Type Algan and Polycrystalline Mgzno/Al Electrodes. Preprints2023, 2023020249. https://doi.org/10.20944/preprints202302.0249.v2.
Nagata, K.; Matsubara, T.; Saito, Y.; Kataoka, K.; Narita, T.; Horibuchi, K.; Kushimoto, M.; Tomai, S.; Katsumata, S.; Honda, Y.; Takeuchi, T.; Amano, H. Improvement of Algan Homoepitaxial Tunnel Junction Deep-UV Light-Emitting Diodes by Controlling the Growth of N-Type Algan and Polycrystalline Mgzno/Al Electrodes. Preprints 2023, 2023020249. https://doi.org/10.20944/preprints202302.0249.v2.
Abstract
Deep-ultraviolet (UV) light-emitting diodes (LEDs) based on AlGaN crystals have low light-emission efficiency; therefore, there is a need to improve this light-emission efficiency for a wide range of applications such as water and air sterilizations. UV-light-transparent device structures are considered one of the many solutions toward increasing light output power. To this end, the present study focused on developing a transparent AlGaN-based tunnel junction (TJ) as the anode of a deep-UV LED. Deep-UV LEDs composed of n+/p+-type AlGaN TJs were fabricated under the growth condition that reduced the carrier compensation in the n+-type AlGaN layers. The operating voltage was 10.8 V under the direct current (DC) operation of 63 A/cm2. In addition, magnesium zinc oxide (MgZnO)/Al reflective electrodes were fabricated to enhance the output power of the AlGaN homoepitaxial TJ LED. The output power was 57.3 mW under a DC operation of 63 A/cm2, and it was 1.7 times higher than that realized using the conventional Ti/Al electrodes. The combination of the AlGaN-based TJ and MgZnO/Al reflective contact allows further improvement of the light output power. This study confirms that the AlGaN TJ is a promising UV-transmittance structure that can obtain a high light-extraction efficiency.
Copyright:
This is an open access article distributed under the Creative Commons Attribution License which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited.
Commenter: Kengo Nagata
Commenter's Conflict of Interests: Author
Could you check the attached file?