Preprint Article Version 1 Preserved in Portico This version is not peer-reviewed

Si-Cr Alloys at Nanoscale

Jovan Maksimovic
,
Haoran Mu
,
Molong Han
,
Daniel Smith
ORCID logo ,
Tomas Katkus
,
Vijayakumar Anand
,
Yoshiaki Nishijima
,
Soon Hock Ng
* ORCID logo ,
Saulius Juodkazis
* ORCID logo
Version 1 : Received: 22 December 2022 / Approved: 27 December 2022 / Online: 27 December 2022 (08:41:50 CET)

A peer-reviewed article of this Preprint also exists.

Maksimovic, J.; Mu, H.; Han, M.; Smith, D.; Katkus, T.; Anand, V.; Nishijima, Y.; Ng, S.H.; Juodkazis, S. Si-Cr Nano-Alloys Fabricated by Direct Femtosecond Laser Writing. Materials 2023, 16, 1917. Maksimovic, J.; Mu, H.; Han, M.; Smith, D.; Katkus, T.; Anand, V.; Nishijima, Y.; Ng, S.H.; Juodkazis, S. Si-Cr Nano-Alloys Fabricated by Direct Femtosecond Laser Writing. Materials 2023, 16, 1917.

Abstract

Ultra-short 230 fs laser pulses of 515 nm wavelength were tightly focused into 700 nm focal spots and utilised in opening ~ 400 nm nano-holes in a Cr etch mask that was tens-of-nm thick. Nano-holes ablated at slightly above the threshold of ablation irradiance became nano-disks and nano-rings at slightly lower pulse energies. Subtle sub-1 nJ pulse energy control was harnessed to pattern large surface areas with controlled nano-alloying of Si and Cr. This technique is extendable to vacuum-free large area patterning of nanolayers by alloying them at distinct locations with sub-diffraction resolution. Such metal masks with nano-hole opening can be used for formation of random patterns of nano-needles with sub-100 nm separation when applied to dry etching of Si.

Keywords

nano-alloy; Si-Cr; Si nano-needles; sub-100 nm; nanoscale

Subject

Chemistry and Materials Science, Nanotechnology

Copyright: This is an open access article distributed under the Creative Commons Attribution License which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited.

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