Preprint Article Version 1 This version is not peer-reviewed

Inhibition Effect of 3D Nanostructures on the Corrosion Resistance of 1-Dodecanethiol Self-Assembled Monolayers on Copper in Nacl Solution

Version 1 : Received: 12 June 2018 / Approved: 13 June 2018 / Online: 13 June 2018 (15:33:35 CEST)

A peer-reviewed article of this Preprint also exists.

Hu, S.; Chen, Z.; Guo, X. Inhibition Effect of Three-Dimensional (3D) Nanostructures on the Corrosion Resistance of 1-Dodecanethiol Self-Assembled Monolayer on Copper in NaCl Solution. Materials 2018, 11, 1225. Hu, S.; Chen, Z.; Guo, X. Inhibition Effect of Three-Dimensional (3D) Nanostructures on the Corrosion Resistance of 1-Dodecanethiol Self-Assembled Monolayer on Copper in NaCl Solution. Materials 2018, 11, 1225.

Journal reference: Materials 2018, 11, 1225
DOI: 10.3390/ma11071225

Abstract

A novel and simple method to improve the corrosion resistance of copper by constructing a 3D 1-dodecanethiol self-assembled monolayers (SAMs) in 3.5% NaCl solution is reported in this study. Several drops of 1% H3PO4 solution are thinly and uniformly distributed on copper surface to form a 3D nanostructure constituted by Cu3(PO4)2 nanoflowers. The anticorrosion properties of 1-dodecanethiol SAMs on copper surface and on copper surface treated with H3PO4 solution were evaluated. Results demonstrated that 1-dodecanethiol SAMs on bare copper surface exhibit good protection capacity, whereas a copper surface pretreated with H3PO4 solution can substantially enhance the corrosion resistance of 1-dodecanethiol SAMs.

Subject Areas

Copper; Phosphoric acid; 3D Nanostructures; 1-dodecanethiol SAMs

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