Submitted:
11 July 2026
Posted:
13 July 2026
You are already at the latest version
Abstract
Keywords:
1. Introduction
- A unified taxonomy for generative EDA. We classify model families—LLM agents, graph/sequence generators, diffusion and GAN pipelines, and physics-integrated autoencoders—by their artifacts and feedback signals. This complements LLM-specific and foundation-model surveys by placing them in a full-flow context [14,15].
- Cross-stage integration. We map how analog and digital netlists propagate into physical design, and illustrate the bidirectional interplay where EM/stress budget and DFM feedback from the manufacturing stage inform and refine earlier synthesis and layout decisions. Prior reviews treat these areas in isolation; we connect them with concrete interfaces and failure modes [10,13].
- Evidence and evaluation. We summarize representative datasets, benchmarks (e.g., LithoBench for computational lithography [13]), and recurring evaluation gaps, especially where cross-paper comparison is weak.
- Data bottlenecks by stage. We distinguish between corpus scarcity, label scarcity, proprietary tool-output dependence, and benchmark fragmentation, and show how each bottleneck shapes which generative methods are practical in logic, AMS, physical design, and manufacturing.
- Guidance for practitioners. We outline when to favor retrieval-grounded LLM agents versus task-specific generators, where physics priors are essential. We discuss practical data-availability constraints and their implications for model choice. We relate these choices to compute limits and toolchain realities [14].
2. Background on Generative AI
2.1. Autoencoder-Based Models (2013– )
2.2. Generative Adversarial Networks (2014– )
2.3. Diffusion Models (2020– )
2.4. Transformer-Based Models (2017– )
2.5. Taxonomy of Generative Methods and Data Constraints
| Design Stage and Task | Method / Tool | Model and Grounding | Feedback / Signal |
|---|---|---|---|
| Logic Synthesis: RTL Generation and Circuit Construction | ChipChat [41] | LLM + interactive prompting | Verilog code, simulation logs |
| DAVE / RTLcoder [42,43] | Fine-tuned LLM | Syntax checks, testbenches | |
| ShortCircuit [44] | Transformer + MCTS | AIG structure, Boolean equivalence | |
| T-Net [45] | Triangular network (Shannon decomp.) | Truth tables, logic correctness | |
| GPT-LS [46] | Decision transformer (offline RL) | Synthesis recipes, QoR metrics | |
| AISYN [47] | RL-based cut selection | AIG rewriting, area/power | |
| SOformer [48] | Causal transformer | QoR prediction, trajectory pruning | |
| Vaegan [26] | VAE-GAN hybrid | Synthetic HLS data, MMD | |
| AMS Design: Topology Selection | AMSnet-KG [49] | LLM + KG-RAG retrieval | Simulation-driven sizing (BO) |
| ADO-LLM [33] | LLM-guided Bayesian optimization | Sampling efficiency, FoM | |
| AnalogCoder [50,51] | LLM and MLLM | SPICE simulation, BO, functionality checks | |
| LaMAGIC [35] | LLM with supervised fine-tuning | SPICE simulation | |
| Artisan [34] | LLM with supervised fine-tuning | SPICE simulation + BO | |
| Atelier [52] | LLM with RAG | SPICE simulation + BO | |
| AnalogGenie [53] | Domain-specific GPT trained on analog netlists | SPICE simulation | |
| AMS Design: Layout | LayoutCopilot [54] | Multi-agent LLM (script generation) | Layout scripts (SKILL / Python) |
| Masala-CHAI [55] | Vision model + LLM | Schematic-to-netlist accuracy | |
| Physical Design: Script Generation | ChatEDA [56] | LLM + LangChain | Syntax correctness, logical accuracy |
| EDAid [57] | LLM + multi-agent (RAG / history) | Debugging logs, interaction history | |
| MCP4EDA [58] | LLM + backend-aware loop | Tool execution logs, PPA metrics | |
| JARVIS [59] | LLM + synthetic data augmentation | Synthetic training samples | |
| Physical Design: Placement and Routing | Painting on Place [60] | cGAN, image-to-image | Congestion heatmaps, overflow estimates |
| Policy-Gradient [61] | RL + DREAMPlace simulator | Total wirelength (HPWL), DRC violations | |
| GAN-Place [28] | GAN with style transfer | Macro locations, geometric similarity | |
| PatternPaint [32] | Diffusion model + litho simulation | Lithography hotspots, DRC rules | |
| Manufacturing: Mask Optimization, Hotspot Correction, and Reliability Modeling | LithoGAN [62] | cGAN | Resist contours, EPE metrics |
| EM-GAN [25] | GAN | Electromigration stress maps, IR drop | |
| Physics-VAE [20] | Physics-integrated autoencoder | Breakdown time, lifetime distribution | |
| CycleGAN-Hotspot [63] | CycleGAN | Hotspot images, wafer yield | |
| GridVAE [64] | VAE | IR drop | |
| GAN-SRAF [65] | GAN | Assist feature placement on layout | |
| GAN-OPC [66] | GAN | Corrected mask, simulated wafer image |
| Domain | Data Availability | Primary Data Bottlenecks | Model Implications |
|---|---|---|---|
| Logic Synthesis | Moderate | Public RTL datasets are small and narrow in design style, making it difficult to train models that generalize across specification types. Functional correctness labels require testbenches that are expensive to write and rarely open-sourced. Evaluation benchmarks vary across works, preventing direct comparison of reported results. | Models rely on self-generated or synthetic supervision, which limits functional correctness guarantees. Generalization across design families and specification formats is poor. Reported accuracy figures are sensitive to benchmark choice and are difficult to reproduce. |
| AMS Design | Low | Structured datasets of analog circuit topologies are small and expensive to curate, as each entry requires expert annotation and time-consuming SPICE simulation. Process-specific design knowledge is largely proprietary and not shared across institutions or companies. | Models depend heavily on retrieval-augmented generation (RAG) or domain-specific fine-tuning to compensate for limited training data. Foundation-model scaling is impractical without much larger open datasets. Human expert involvement remains necessary throughout the design loop. |
| Physical Design | Moderate | Many large-scale placement and routing datasets are generated by proprietary EDA tools under non-disclosure agreements, restricting public access. Open benchmarks cover only a subset of real industrial flows, and the labels (e.g., congestion maps, timing reports) are tool-specific and do not transfer across toolchains. | Models trained on open datasets transfer poorly to industrial toolchains. Academic metrics such as half-perimeter wirelength (HPWL) do not always correlate with real PPA outcomes. Results reported on open benchmarks may not reflect performance on proprietary designs. |
| Manufacturing, Yield, and Reliability | Low | Defect and failure events are rare in production, so labeled inspection datasets are heavily imbalanced: non-defective samples vastly outnumber defective ones. Fab-internal process data and failure signatures are proprietary and not released publicly. The diversity of failure modes across process nodes and design styles is rarely captured in available datasets. | Severe class imbalance limits the ability of models to detect and characterize rare but critical failure modes. Data augmentation and physics-based simulation are commonly used to compensate, but augmented data may not capture the full range of real failure signatures. Physics-informed or hybrid models are often necessary to produce outputs that are physically meaningful under process variation. |
3. Logic Synthesis
3.1. RTL and High-Level Code Generation
3.2. Generative Circuit Construction
3.3. Synthesis Flow Optimization
3.4. Predictive Modeling and Solver Acceleration
3.5. System-Level Generative Synthesis
3.6. Limitations of Current Models and Resource Requirements
4. Analog/Mixed-Signal Circuit Design
4.1. AMS Topology Synthesis
4.1.1. LLM-Based Topology Synthesis
4.1.2. Custom Generative Models
4.2. AMS Circuit Sizing
4.3. Analog Layout
4.4. Schematic and Document Parsing
4.5. Trends, Limitations, and Future Directions
5. Physical Design
5.0.1. Tool Script Generation
5.0.2. Placement and Routing
5.1. Tool Script Generation
5.1.1. First Stand alone
5.1.2. Multi-agent collaboration
5.1.3. Close-loop feedback
5.1.4. Data augmentation
5.2. Placement and Routing
5.2.1. Congestion awareness Placement
5.2.2. Routability awareness Placement
5.2.3. Style Transfer for Layout Distribution
5.2.4. DRC Rule Compliance Placement and Data Augmentation
5.3. Trends, limitations, and future directions
6. IC Yield and Reliability
6.1. Data Augmentation
6.2. Defect Localization and Spatio-Temporal Modeling
6.3. Mask Optimization and Lithography Modeling
6.4. Generative and Physics-Aware Modeling for Packaging Yield and Reliability
6.5. Trends, Limitations, and Future Directions
7. Conclusions
Acknowledgments
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