Version 1
: Received: 2 January 2024 / Approved: 3 January 2024 / Online: 3 January 2024 (16:42:04 CET)
How to cite:
Kim, M.S.; Shin, S.; Kim, W.Y.; Lee, S.H.; Park, S.R.; Kim, S.; Cho, Y.T. Formation of Multiscale Porous Surfaces via Evaporation-Induced Aggregation of Imprinted Nanowires with Highly Viscous Photocurable Materials. Preprints2024, 2024010278. https://doi.org/10.20944/preprints202401.0278.v1
Kim, M.S.; Shin, S.; Kim, W.Y.; Lee, S.H.; Park, S.R.; Kim, S.; Cho, Y.T. Formation of Multiscale Porous Surfaces via Evaporation-Induced Aggregation of Imprinted Nanowires with Highly Viscous Photocurable Materials. Preprints 2024, 2024010278. https://doi.org/10.20944/preprints202401.0278.v1
Kim, M.S.; Shin, S.; Kim, W.Y.; Lee, S.H.; Park, S.R.; Kim, S.; Cho, Y.T. Formation of Multiscale Porous Surfaces via Evaporation-Induced Aggregation of Imprinted Nanowires with Highly Viscous Photocurable Materials. Preprints2024, 2024010278. https://doi.org/10.20944/preprints202401.0278.v1
APA Style
Kim, M.S., Shin, S., Kim, W.Y., Lee, S.H., Park, S.R., Kim, S., & Cho, Y.T. (2024). Formation of Multiscale Porous Surfaces via Evaporation-Induced Aggregation of Imprinted Nanowires with Highly Viscous Photocurable Materials. Preprints. https://doi.org/10.20944/preprints202401.0278.v1
Chicago/Turabian Style
Kim, M.S., Seok Kim and Young Tae Cho. 2024 "Formation of Multiscale Porous Surfaces via Evaporation-Induced Aggregation of Imprinted Nanowires with Highly Viscous Photocurable Materials" Preprints. https://doi.org/10.20944/preprints202401.0278.v1
Abstract
Numerous structures at the nano- and microscale manifest distinctive properties with far-reaching implications across diverse fields, including electronics, electricity, medicine, and surface engi-neering. Established methods such as nanoimprint lithography, photolithography, and self-assembly play crucial roles in the fabrication of nano- and microstructures; however, they exhibit limitations in generating high-aspect-ratio structures when utilizing high-viscosity pho-tocurable resins. In response to this inherent challenge, we propose a highly cost-effective ap-proach facilitating the direct replication of high-aspect-ratio structures, specifically nanowires, through the utilization of anodized aluminum substrates. This study elucidates the streamlined fabrication process for multiscale porous surfaces achieved through the evaporation-induced in-tegration of solid nanowires printed with high-viscosity photocurable resin.
Copyright:
This is an open access article distributed under the Creative Commons Attribution License which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited.
