Submitted:
20 June 2026
Posted:
22 June 2026
You are already at the latest version
Abstract
Keywords:
1. Introduction
2. Methodology
3. Ag-Based Coatings Produced by Electrodeposition
3.1. Overview of Electrodeposition for Ag-Based Coatings
3.2. Selected Examples of Electrodeposited Ag-Based Composite Coatings Using Ag and Other Metal Salts
3.3. Selected Examples of Electrodeposited Ag-Based Composite Coatings by Incorporation of Insoluble Particles in the Ag Plating Baths
4. Ag-Based Coatings Produced by Magnetron Sputtering
4.1. Overview of Magnetron Sputtering for Ag-Based Coatings
4.2. Selected Examples of Magnetron Sputtered Ag-Based Coatings
5. Ag-Based Coatings Produced by Electrospark Deposition
5.1. Overview of Electrospark Deposition for Ag-Based Coatings
5.2. Selected Examples of Electrospark Deposited Ag-Based Composite Coatings
6. Ag-Based Coatings Produced by Thermal Spraying
6.1. Overview of Thermal Spraying for Ag-Based Coatings
6.2. Selected Examples of Thermally Sprayed Ag-Based Coatings
7. Ag-Based Coatings Produced by Electrical Explosion Spraying (EES)
7.1. Overview of Electrical Explosion Spraying for Ag-Based Coatings
7.2. Selected Examples of Ag-Based Coatings Produced by Electrical Explosion Spraying
8. Comparative Analysis of the Properties and Performance of Ag-Based Coatings Produced by Different Deposition Technologies
9. Current Challenges and Future Perspectives in Ag-Based Coatings for Electrical Contacts
9.1. Current Challenges
Fretting Corrosion and Fretting Wear
Tarnishing and Corrosion
Arc Erosion and Contact Welding
Cost and Environmental Concerns
9.2. Future Perspectives
Advanced Nanocomposite Contacts
Sustainable Processing Technologies
Multifunctional and Adaptive Coatings
10. Conclusions
Author Contributions
Funding
Institutional Review Board Statement
Informed Consent Statement
Data Availability Statement
Conflicts of Interest
Abbreviations
| AISI | American Iron and Steel Institute |
| AE | anode erosion |
| APS | atmospheric plasma spraying |
| AFM | atomic force microscopy |
| CMG | cathode mass gain |
| CVD | chemical vapor deposition |
| COF | coefficient of friction |
| CS | cold spraying |
| CCT | concentric composite target |
| CCF | current-carrying friction |
| DLC | diamond-like carbon |
| DC | direct current |
| DP | double pulse |
| DPED | double-pulse electrodeposition |
| DPEP | double-pulse electroplating |
| ECMs | electrical contact materials |
| ECR | electrical contact resistance |
| EES | electrical explosion spraying |
| EBT | electron beam treatment |
| EP | electroplating |
| ESA | electrospark alloying |
| ESD | electrospark deposition |
| EDS | energy dispersive spectrometry |
| FE-TEM | field emission glancing angle deposition transmission electron microscopy |
| GLAD | glancing angle deposition |
| GLACD | glancing angle co-deposition |
| G | graphene |
| HAZ | heat-affected zone |
| HiPIMS | high power impulse magnetron sputtering |
| HT | high temperature |
| HVAF | high-velocity air fuel |
| HVOF | high-velocity oxygen fuel |
| HPS | hot-pressing-sintering |
| LT | low temperature |
| LV | low voltage |
| MV | medium voltage |
| HV | high voltage |
| LCA | life cycle assessment |
| MMCs | metal matrix composites |
| AgMCs | silver matrix composites |
| CNTs | carbon nanotubes |
| MTC | mass transfer coefficient |
| MS | magnetron sputtering |
| MWCNTs | multi-walled carbon nanotubes |
| NIR | near-infrared |
| NPs | nanoparticles |
| NA | nicotinic acid |
| NR | not reported |
| OM | optical microscopy |
| FCC | face-centered cubic |
| PVD | physical vapour deposition |
| RF | radio frequency |
| RT | room temperature |
| RMS | root mean square |
| RCE | rotating cylinder electrode |
| SEM | scanning electron microscopy |
| SDS | sodium dodecyl sulphate |
| SECs | sliding electrical contacts |
| SS | stainless steel |
| scfh | standard cubic feet per hour |
| TS | thermal spraying |
| XRF | X-ray fluorescence |
| XMT | X-ray microtomography |
| XPS | X-ray photoelectron spectroscopy |
| WE | working electrode |
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|
Electrolyte Composition |
Electrode Characteristics |
Synthesis Conditions |
Ag-Based Coating Characteristics |
References |
| 5 mM AgSO4, 250 mM SC(NH2)2, 285 mM Na3C6H5O7 + 30 mM, 75 mM, or 150 mM Na2WO4·2H2O |
Cathode: Cu disc (Ø6.2 mm) (rotating cylinder electrode (RCE) with 4.5 mm recess in a cylindrical Teflon holder Anode: Pt mesh |
Current density: 5–320 mA/cm2 for 10 min, under galvanostatic control, 25 °C, 10 mV/s, Electrolyte pH: 2 RCE rotation rate: 350 rpm (turbulent flow) |
Ag-W compounds with S and O with 2–18 wt.% W, Surface morphology: (i) at 5 mA/cm2: rough, plate-like for 30–75 mM Na2WO4, and smooth, nodular for 150 mM Na2WO4, (ii) at 320 mA/cm2: dendritic for 30–150 mM Na2WO4 |
[45] |
| 26 g/L AgNO3, 140 g/L DMH, 100 g/L K2CO3, 60 g/L K4P2O7, 0-4 g/L KSbOC4H4O6 (APT), 0-4 g/L NaKC4H4O6 (SPT), SPT/APT ratio of 5:1 |
Cathode: Cu sheet (10 × 20 × 5 mm3), mirror finish polished Anode: Ag sheet (20 × 35 mm2) |
Deposition time: 30 min, under galvanostatic control, RT, deposition potential: –0.8 VSCE, stirring speed: 60 rpm, Electrolyte pH: 10 |
Ag-Sb films with 0–2.72 wt.% Sb, Film thickness: 5.27–5.83 μm, Vickers hardness: 88.1–146.5 HV, COF: 0.56–0.79 (dry sliding), Wear rate: 0.84–8.64 × 10−6 mm3/N⋅m, Corrosion rate (in 3.5 wt.% NaCl solution): 1.41–38.5 × 10−2 mm/year | [23] |
| Reinfor-cement Particles |
Electrolyte Composition |
Electrode Characteristics |
Synthesis Conditions |
Ag-Based Coating Characteristics |
References |
| TiB2 nano-particles (NPs) | 10 g/L AgNO3, 10 g/L KCN, 0.1 g/L sodium dodecyl sulphate (SDS), TiB2 NPs: 0.5 g/L, 1.0 g/L, 2.0 g/L, and 4.0 g/L |
Cathode: Cu contact buttons (Ø4 mm) removed from Himel HDC6-9 contactors, with surface roughness Ra: 3–5 μm Anode: high- purity Ag plate |
Bath temperature: 50 ± 1 °C, Electrolyte pH: 9–10, magnetically stirring, Process: direct current (DC) electroplating: Deposition time: 2 h, Current density: 5 A/dm2, Coating rate: 0.62 μm/min for 1.0 g/L TiB2 addition |
Pure Ag coating: Hardness: 74.1 HV, Electrical resistivity: 0.278 Ω Ag-TiB2 coating thickness: 74.6 μm (1.0 g/L TiB2), Hardness: 79.5–82.2 HV, Electrical resistivity: 0.280–0.294 Ω |
[65] |
| MWCNTs with diameter × length of 100–150 nm × 10 μm, CNT density of 2.1 g/cm3 |
0.2 M AgI, 2.5 M KI, 10 g/L CNTs |
Cathode: pure Cu plate (C1020), exposed surface area: 30 × 33.3 mm2 Anode: pure Ag plate |
(i) Current density: 30 mA/cm2, electrical charge: 9 C/cm2 (for Ag strike/Cu), (ii) Current density: 10 mA/cm2, RT, pH: 12 + aeration (for Ag/CNT film/Ag strike/Cu) |
Ag-1.2 vol.% CNT coatings, Vickers hardness: 63.2 HV, Thicknesses: NR, Electrical resistivity: 1.9 μΩ cm, COF: 0.4–0.5 (dry sliding) |
[63] |
| Graphene (G) with 1–3 layers, sheet size of 7–12 μm, and 98% carbon content |
45 g/L AgNO3, 100 g/L C6H5NO2, 77 g/L CH3COONH4, 70 g/L K2CO3, 45 g/L KOH, 32 mL/L NH3·H2O, 0.05 g/L SDS, 0.05 g/L C12H25SO3Na, 0.05 g/L PEG 400, 0.5 g/L G |
Cathode: Cu plate (50 × 50 × 0.8 mm3), exposed surface area: 30 × 10 mm2 (Ra ≤ 0.03 μm) Anode: pure Ag plate |
Current density: 0.24 A/dm2, Electrolyte stirring speed: 300 rpm, Electrolyte pH: 9.5–10, Bath temperature: 25 ± 1 °C, Bath volume: 1 L |
Ag-G coating thickness: 13–16 μm, Surface roughness Ra: 0.3 μm, Hardness: 120 HV, COF: 0.54 (dry sliding), High resistance to arc ablation |
[44] |
| Graphene (G) | (i) pre-Ag plating: 5 g/L AgNO3, 80 g/L C5H8N2O2, 30 g/L C6H5NO2, 7 g/L K2CO3, 5 g/L KOH, (ii) Ag/G plating: 45 g/L AgNO3, 100 g/L C6H5NO2, 77 g/L CH3COONH4, 30 g/L K2CO3, 45 g/L KOH, 6 mL/L NH3·H2O, 0.2 g/L SDS, 0.2 g/L C12H25SO3Na, 0.2 g/L (C6H9NO)n, 0.5–2 g/L G |
Cathode: Cu plate (50 × 50 × 5 mm3), exposed surface area: 50 × 10 mm2 Anode: Ag bar (99.99% purity) |
Current density: 0.004 A/dm2 for 120 s (pre-Ag plating), and 0.6 A/dm2 for 1.5 h (Ag/G plating), Electrolyte stirring speed: 250 rpm for 1 h, Electrolyte pH: 9.5–10, Bath temperature: 27 ± 1 °C, Double-pulse electrodeposition (DPED) |
Ag/G film thickness (DP): 40.5–41.5 μm, Hardness (DP): 125.81–161.93 HV, COF: 0.41–0.63 (dry sliding, CCF, 5 A), Surface roughness Ra: 41.3 nm and electrical contact resistance: 10 mΩ (DP-Ag/G films, 2 g/L G) |
[46] |
| Graphene (G) black powder: a few layers, sheet diameter of 7–12 μm, ≥ 98% carbon, Graphene oxide (GO): a few layers, sheet diameter of 5–10 μm, brown powder |
AgNO3: 45 g/L, C6H5NO2: 100 g/L, CH3COONH4: 76 g/L, K2CO3: 72 g/L, KOH: 45 g/L, NH3·H2O: 32 mL/L (all coatings: #1–#4) and: (i) C12H25NaO4S: 0.030 g/L, C18H29NaO3S: 0.038 g/L, (C6H9NO)n: 0.023 g/L (#1 coating), (ii) 0.75 g/L G (#2 coating), (iii) 0.75 g/L GO (#3 and #4 coatings), Deposition coating thickness: 15 ± 2 μm |
Cathode: T2 Cu violet plate (50 × 50 × 0.5 mm3), exposed surface area: 50 × 10 mm2 Anode: Ag plate (25 × 40 × 2 mm3, 99.9% purity) |
Bath temperature: 30 ± 1 °C, Electrolyte pH: 9.5–10.5, Electrolyte stirring speed: 260 rpm, Process: DC EP (#1, #2, #3), DPEP (#4), Forward current density: 0.26 A/dm2 (#1, #2, #3), and 0.45 A/dm2 (#4), Negative current density: 0.08 A/dm2 (#4), Forward duty cycle: 67.5% (#4), Negative duty cycle: 32.5% (#4) |
13.8 μm thick Ag coating (#1), 13.7–16.1 μm thick Ag-G coatings (#2–#4), Hardness (HV0.2): 92 (#1)–144.1 HV (#4), Surface roughness Ra: 25.5 nm (#4)–104.2 nm (#2), COF (dry sliding, CCF, 5 A): 0.506 (#1)–0.650 (#1), Average ECR: 30 mΩ (#4)–92 mΩ (#1) |
[66] |
| Property |
Ag/G Coating (DC, 2 g/L G) |
Ag/G Coating (DP, 2 g/L G) |
Pure Ag Coating |
Improvement in DP-deposited Ag/G Coating (2 g/L Graphene) |
| Average thickness |
46.8 μm | 41.5 μm | 40.6 μm | Comparable thicknesses, DP composite coating is 5.3 μm thinner than DC coating |
| Ag grain size | 26.037 nm | 21.560 nm | 27.065 nm | Grain refinement by synergistic DMH-NA coordination and DP deposition |
| Surface roughness (Ra) |
92.3 nm | 41.3 nm | 62.9 nm | ~34–55% reduction in Ra, yielding a smooth, dense surface |
| Average Vickers hardness |
122.04 HV | 161.93 HV | 99.20 HV | ~33–63% increase due to grain refinement and dispersion strengthening |
| Average COF (dry sliding, CCF, 5 A) |
0.63 | 0.41 | 0.72 | ~35–43% reduction in COF due to self-lubricating graphene and smoother surface |
| Average wear volume (CCF, 5 A) |
6.53 × 105 μm3 | 2.28 × 105 μm3 | 8.0 × 105 μm3 | ~65–72% reduction in wear volume due to graphene lubrication effect |
| Electrical contact life (at 5 A, 24 V) | ~0.5 × 105 cycles | ~1.0 × 105 cycles | ~0.23 × 105 cycles | Improved electrical performance, two–fourfold increase in service life |
| Contact resistance (at 5 A, 24 V) |
6–20 mΩ |
10 mΩ | 8-60 mΩ | More stable contact resistance due to dense and smooth surface |
|
Sputtering Target Characteristics |
Substrate Characteristics |
Deposition Parameters |
Ag-Based Coating Characteristics |
References |
| Ag target (purity 99.999%), Grain size: 50–150 μm |
GH4169 (Inconel 718) Ni-based superalloy substrates, Dimensions: 30 × 10 × 5 mm3 |
Base pressure ≤ 1 × 10−3 Pa, Working gas: Ar gas, Ar flow rate: NR, Sputtering pressure: 0.5 Pa, Bias voltage: 800 V for 15 min plasma etching, 140 V during MS, Sputtering power: 150 W, Deposition time: 60 min at LT |
3.75 μm thick Ag coatings, Average hardness: ~135 HV at RT, ~84 HV at HT, Average COF: 0.56–0.8 at RT, ~0.3–0.5 at HT, Bonding force: 23 N at RT, and 16 N at HT, Wear rate: 0.31–0.44 × 10−5 mm3/N·m at RT, and 0.17–0.25 × 10−5 mm3/N·m at HT |
[17] |
| Ag-In-Cu 98-1-1 (wt.%), Ag-In-Cu 96-1-3 (wt.%), and Ag-In-Cu 94-1-5 (wt.%) disks (Ø50 mm) |
Al 6061 alloy substrates, Dimensions: 20 × 20 × 4 mm3, Surface roughness Ra: 6 nm |
Base pressure ≤ 3 × 10−3 Pa, Working gas: Ar gas (purity 99.99%), Ar flow rate: 15 sccm, Sputtering pressure: 0.7 Pa, Sputtering power: 20–40 W, Power density: 1.02–2.04 W/cm2, Deposition time: 1–3 min at RT |
Ag-In-Cu films, Thickness: (32.0 ± 0.6)–(103.5 ± 0.8) nm, Average surface roughness Ra: 8–12.4 nm, Surface morphology: granular texture, average grain size: 9–18 nm |
[68] |
| Ag circular target (purity 99.95%, Ø152.4 mm) Cu circular target (purity 99.99%, Ø152.4 mm) |
Ti6Al4V disk-shaped substrates, Dimensions: Ø10 mm × 1 mm |
Base pressure ≤ 5 × 10−6 Torr, Ar flow rate: 30 sccm, Sputtering pressure: 5 mTorr, Target to substrate distance: 200 mm, Substrate rotation speed: 5 rpm, HiPIMS: frequency: 250 Hz, pulse on-time: 100 μs/150 μs, peak current: 50 A/80–200 A, voltage: 989 V/593–802 V, Pmean: 1.2 kW/1.8–6 kW, Deposition rate: 0.62–0.76 nm/s for Ag target/Cu target (duty cycle: 2.5%/3.75%), Deposition time: 1 min |
Ag-Cu bimetallic coatings, Cu to Ag concentration ratio: 1.9–4.4, Crystallite sizes: 1.2–1.8 nm, Thickness: NR, Surface roughness: NR, Hardness: NR, COF: NR, Wear rate: NR |
[76] |
| Ag circular target (purity 99.9%, Ø85 mm × 5 mm) Cu circular target (purity 99.99%, Ø85 mm × 5 mm) |
Si (100) wafers, AISI 400C stainless steel substrates, Surface roughness Ra ≤ 0.02 μm |
Base pressure ≤ 3 × 10−3 Pa, Working pressure (Ar gas): 0.8 Pa, Bias voltage: −80 V, Duty ratio of negative bias: 75%, Sputtering current density: ~0.21 mA/mm2 and target to substrate distance: 70 mm for both Ag and Cu targets, Substrate rotation speed: 10 rpm, Deposition rate at RT: 15 nm/min for Ag, and 12 nm/min for Cu |
Total thickness of Ag/Cu multilayer films: ~2.5 μm (15 nm thick Ag layer + 4 nm, 8 nm, 12 nm, 16 nm, 20 nm thick Cu layer, denoted AC-4, AC-8, AC-12, AC-16, AC-20), Crystallite sizes: 5–9 nm, Nanoindentation hardness HIT (AC-20): 4.3 GPa, μmean (AC-20): 0.19, Wear rate (AC-20): 6.25 × 10−7 mm3/N·m |
[82] |
| CCT: Carbon target (Ø50 mm) + Ag tablet: Ø5–20 mm, Area rate of Ag/C: 0.010–0.190 |
Si (100) substrates, Dimensions: 20 × 40 × 0.5 mm3 |
Process gas: Ar gas, Ar flow rate: 4.4 sccm, Sputtering pressure: 0.11 Pa, RF power: 75 W, 125 W, and 175 W, Deposition distance: 70 mm, Deposition time: 1 h |
Ag/DLC coatings, Mean thickness: 0.1–0.9 μm, Ag content: 6–65 at.%, Structure: granular, Nanoindentation hardness (HIT): ~2.5–20 GPa, COF < 0.2 (~0.5 μm thick Ag/DLC coating with 46 at.% Ag) |
[83] |
|
Electrode (Anode) Characteristics |
Substrate Characteristics |
Deposition Parameters/ Equipment Type |
Ag-Based Coating Characteristics/Remarks |
References |
| Pure Ag and Ag-3 at.% C |
Cu substrates |
Capacitance: 200 µF, Current: 1 A, Discharge: peak current Ia ≈ 220 A, peak voltage Ua ≈ 34 V, Pulse duration: ~100 µs, Pulse energy Wp ≈ 0.2 J, Mean diameter of the anode crater: 300 µm, Equipment: Elitron-22 |
Ag and Ag-C coating characteristics (thickness, phase composition, microstructure, porosity, surface roughness, adhesion strength, hardness, wear rate, conductivity, contact resistance, COF, etc.): NR | [48] |
| Pure Ag, Ni, Ag-25% Ni (SN-25), Ag-50% Ni (SN-50), and Ag-75% Ni (SN-75) |
Cu substrates |
Pulse energy: 0.04–0.155 J, Equipment: Elitron-22 |
Ag, Ni, and Ag-Ni coating thickness: 1–5 μm, Ag/Ni concentration ratio at the coating surface: 2.97 ± 0.15 (SN-25), 1.25 ± 0.10 (SN-50), 0.34 ± 0.06 (SN-75) | [95] |
| Pure Ag wire (Ø2 mm × 20–40 mm, < 30° tip) |
Cu plates (400 mm2 area, thickness: ~ 1 mm) |
Pulse energy (Wp): 0.036–0.206 J, Pulse duration (τp): 110–180 μs, Pulse current amplitude: 100–230 A, Pulse voltage amplitude: 10–34 V, Capacitance: 200–500 μF, Equipment: Elitron-22, Elitron-12 |
Ag coating characteristics: NR, Optimal Ag deposition: Wp ≈ 0.15–0.17 J, τp ≈ 135 μs, Cathode mass gain: ~23 mg/cm2, Maximum molten material transfer, with moderate vaporization losses and controlled cathode erosion. |
[100] |
| Pure Ag rod (Ø1 mm × 30–35 mm, 15° tip) |
Cu substrates |
Pulse duration: 200 µs, Pulse energy: 0.1–1 J, DC magnetic field induction: 0.01–0.1 T, DC current density: ~0.5–3 A/mm2 passing through the cathode and anode, Equipment: EFI-10M |
Ag coating characteristics: NR, Analysis of Ag quasi-regular transfer oscillations from anode to cathode and transfer mechanisms in Ag coatings on Cu substrates under ESA with a magnetic field. |
[97,98] |
| Pure Ag (99.99%) as transition coating for antifriction Babbitt B83 alloy (Ø3 mm rods) |
Tin bronze QSn10-1 substrates (25 × 29 × 4 mm3) |
Voltage: 40–60 V (Ag), 20–30 V (B83), Duty cycle: 20–30% (Ag, B83), Efficiency: 1 min/cm2 (Ag), 3 min/cm2 (B83), Travel speed: 3 mm/s, Frequency: 400 Hz, Rotation speed of the layers: 550 rpm, Ar gas (99%) flow rate: 15 L/min |
B83/Ag bilayer coatings, Total coating thickness: 30–80 µm, Surface roughness Ra: 5.97–19.43 µm, Mass transfer: 27.6–125.2 mg, Smooth, dense surface layer, compact micro-structure, and COF: ~0.177 (80 µm thick coating) |
[51] |
|
Feedstock Materials |
Substrate Characteristics |
Spraying Methodand Deposition Parameters |
Ag-Based Coating Characteristics |
References |
| Water-atomized Ag powder (spherical to irregular particles of 15–50 μm) |
Stainless steel (AISI 347) substrates |
Cold spraying (CS), Process and powder carrier gas: compressed air, Air preheat temperature: 250–450 °C, Air pressure: 1–2 MPa, Average powder particle velocity: 363–469 m/s, Stand-off distance: 15 mm |
Ag coatings, Thickness: 650 ± 25 μm, Surface roughness Ra: 6.90 ± 0.79 μm, Electrical conductivity: 35–43 MS/m Hardness (HV0.1): ~112–133 HV, Porosity: ~0.1–0.32% |
[53] |
| Gas-atomized Ag powder (spherical particles of 15–50 μm) and Ni powder (spherical to irregular particles of 10–40 μm) |
Stainless steel (AISI 316) plates, Dimensions: 25 × 25 × 3 mm3, Ø25.4 × 3 mm2, Average hardness (HV0.05): 231.3 HV |
Cold spraying (CS), Accelerating gas: N2, Gas pressure: 4 MPa, Gas temperature: 750 °C (Ni), 600 °C (Ag), Gun traverse speed: 700 mm/s (Ni), 300 mm/s (Ag), Stand-off distance: 25 mm, Multiple CS passes, Powder feed rate: 30 g/min (Ni), 50 g/min (Ag) |
Ag/Ni bilayer coatings 300 μm thick Ag top coating, Average hardness (HV0.05): 116.2 HV, 100 μm thick Ni bond layer, Average hardness (HV0.05): 172.5 HV, Porosity: < 1%, Surface roughness Ra: 4.17 ± 1.31 μm 300 μm thick Ag monolayer coating, Surface roughness Ra: 6.74 ±2.76 μm |
[101] |
| Gas-atomized Ag powder (spherical particles of 40–70 μm) |
Low carbon steel substrates, Dimensions: Ø25 × 10 mm2 |
Atmospheric plasma spraying (APS), Current: 500 A, Primary gas (Ar) flow rate: 90 scfh, No secondary gas, Carrier gas (Ar) flow rate: 7 scfh, Spraying distance: 120 mm, Gun speed: 500 mm/s |
Ag/CoNiCrAlY bilayer coatings, 200 μm thick Ag top coating, Microstructure: disk-like splat, Porosity: ~2.6%, Surface roughness: 4.59 μm, Bonding strength: 27.5 MPa, Average hardness (HV0.1): ~144 HV, 100 μm thick CoNiCrAlY bond layer | [102] |
| Ag-Ni 70-30 wt.% fine and coarse powder mixtures (initial particle size: Ag < 25 μm or 38–75 μm, Ni < 10 μm) |
Cu substrates, Dimensions: 50 × 50 × 2 mm3, Vickers hardness (HV0.5): 90 ± 2 HV |
Cold spraying (CS), Accelerating gas: N2, Inlet gas pressure: 3 MPa, Gas temperature: 400 °C, Scanning speed of the CS gun: 50 mm/s, Stand-off distance: 40 mm between the nozzle exit and the substrate, Two CS passes, Powder feed rate: ~25 g/min |
Ag-Ni coatings with fine/coarse microstructure (FM/CM) from fine/coarse Ag-Ni powder mixtures, Thickness: 2 mm, Porosity: < 1%, Ni content in the coatings: ~21 wt.% (FM), 13.8 wt.% (CM), Hardness (HV0.5): 95 HV (FM), 130 HV (CM) |
[121] |
| Ag-Ni 70-30 (irregular Ag particles of 25–38 μm, Ni particles < 5 μm), and Ag-SnO2 92-8 (spherical Ag particles < 25 μm, and SnO2 particles < 10 μm) powder mixtures |
Cu substrates, Dimensions: 50 × 50 × 2 mm3, Vickers hardness (HV0.5): 90 HV, and brass contact parts |
Cold spraying (CS), Accelerating gas: N2, Inlet gas pressure: 3 MPa, Gas temperature: 400 °C, Scanning speed of the CS gun: 50 mm/s, Stand-off distance: 40 mm between the nozzle exit and the substrate, Two CS passes, Powder feed rate: ~25 g/min |
Ag-Ni coatings, Thickness: 2 mm, Porosity: 0.64%, Ni content in the coatings: ~21 wt.%, Hardness: 95 ± 2.7 HV, Ultimate strength: 162 MPa, Young’s modulus: 98 GPa, Good erosion resistance, Ag-SnO2 coatings, Thickness: 2 mm, Porosity: 0.004%, SnO2 content in the coatings: ~2.6 wt.%, Hardness: 151 ± 1.5 HV, Ultimate strength: 202 MPa, Young’s modulus: 111.5 GPa Good erosion resistance |
[122] |
| Ag-C 97-3 wt.% powder mixture | Cu substrates, Dimensions: Ø100 mm × 5 mm |
Cold spraying (CS), Working pressure: 5 MPa, Spray distance: 30 mm, Other CS parameters: NR |
Ag-C coatings, Thickness: 60 μm, Surface roughness Rq: 7.875 μm, Electrical resistance: ~2.6 × 10−6 Ω·cm, Good arc erosion resistance under DC switching conditions (10,000 cycles, 0.8 N contact force). |
[25] |
| Water-atomized Ag-SnO2 88-12 wt.% powder, and Ag-C 95-5 wt.% powder mixture |
Cu, brass, and Al substrates, Hardness (HV0.3): 70 HV (brass), 100 HV (Cu), 130 HV(Al) |
Cold spraying (CS), Accelerating gas: N2, Inlet gas pressure: 2–3 MPa, Gas temperature: 300–600 °C, Stand-off distance: 40–60 mm between the Laval nozzle exit and the substrate, Feed rate: 25–50 g/min |
Fully densified Ag-SnO2 coatings, Thickness: 3 mm, Plate-like structure, Average hardness (HV0.3): 125 HV, Shear bonding strength: 9.5–26 MPa, Ag-C coatings tend to debond at thickness of max. 1 mm |
[123] |
| Ag-SnO2 88-12 wt.% powder (initial particle size: Ag < 70 μm, and SnO2: 30–50 nm) |
Cu substrates, Dimensions: NR | Atmospheric plasma spraying (APS), Current: 330 A, Voltage: 95 V, Primary gas (Ar) flow rate: 95 L/min, Secondary gas (H2) flow rate: 10 L/min, Carrier gas (Ar) flow rate: 4 L/min, Powder feed rate: 25 g/min, Spraying distance: 100 mm |
Fully densified Ag-SnO2 coatings, Thickness: 600 μm, Splat-like morphology, lamellar structure, Average hardness (HV0.2): 109 HV, Average bonding strength: 17.9 MPa, Low arc erosion rate: 39.9 μg/C (under 500 discharge cycles). |
[124] |
|
Feedstock Materials |
Substrate Characteristics |
Deposition Parameters |
Ag-Based Composite Coating Characteristics |
References |
| Ag foil (0.2463 g) filled with a W powder (0.434 g) |
Electrolytic Cu (KPV-604 contacts), Mean roughness Ra: 25.397 nm, Mean hardness: 119.4–122 HV |
Plasma action time: ~100 μs, Absorbed power density on the jet axis: ~8.2 GW/m2, Shock-layer pressure (near surface): ~18.8 MPa, Energy modes (coaxial electrode voltage): U1 = 2.4 kV, U2 = 2.5 kV, U3 = 2.6 kV |
Ag-W coatings, Thickness: (49.04 ± 0.7)–(68.5 ± 0.9) μm, Average surface roughness Ra: 75.412 nm (mode 2/U2), Average hardness: ~382 HV (mode 1/U1)–457.5 HV (mode 2/U2) |
[34] |
| Ag foil (0.25 g) filled with a CuO powder (0.12 g) |
Electrolytic Cu (KPV-604 contacts) |
Plasma action time: ~100 μs, Absorbed power density on the jet axis: ~5.5 GW/m2, Shock-layer pressure (near surface): ~12.5 MPa, Residual gas pressure in the working chamber: ~100 Pa, Plasma temperature at the nozzle exit: ~104 K, Heat affected zone thickness: ~50 μm |
Ag-CuO coatings, Thickness: 75–95 μm, Microstructure: Ag matrix with CuO inclusions (2–500 nm), Roughness Ra: 73 nm, Twofold increase in service life, contact resistance: 4–15.7 μΩ (at 400/230 V, 320 A, 50 Hz, cosϕ = 0.35, N = 6000 commutation cycles) |
[35] |
| Ag foil (0.25 g) filled with a CdO powder (0.05 g) |
Electrolytic Cu (KPV-604 contacts) |
Plasma action time: ~100 μs, Absorbed power density on the jet axis: ~5.5 GW/m2, Shock-layer pressure (near surface): ~12.5 MPa, Residual gas pressure in the working chamber: ~100 Pa, Plasma temperature at the nozzle exit: ~104 K |
Ag-CdO coatings, Thickness: ~60 μm, Microstructure: Ag matrix with inclusions of Cu (20–50 nm), Cd3Cu4 (30–40 nm), CdO2 (15–50 nm), and Ag2O3 (5–10 nm) |
[38] |
| Ag foil (0.25 g, 20 μm thick) filled with a ZnO powder (0.08 g) |
Electrolytic Cu (CJ20 contacts) |
Plasma action time: ~100 μs, Absorbed power density on the jet axis: ~5.5 GW/m2, Shock-layer pressure (near surface): ~12.5 MPa, Residual gas pressure in the working chamber: ~100 Pa, Plasma temperature at the nozzle exit: ~104 K |
Ag-ZnO coatings, Thickness: 30–60 μm, Microstructure: Ag matrix with ZnO inclusions (2–15 nm), Twofold increase in service life, ECR: 3.2–14.1 μΩ (at 400/230 V, 320 A, 50 Hz, cosϕ = 0.35, N = 6000 commutation cycles) |
[40] |
| Ag foil (0.25 g) filled with a SnO2 powder (0.05 g) |
Electrolytic Cu (KPV-604 contacts) |
Plasma action time: ~100 μs, Absorbed power density on the jet axis: ~5.5 GW/m2, Shock-layer pressure (near surface): ~12.5 MPa, Residual gas pressure in the working chamber: ~100 Pa, Plasma temperature at the nozzle exit: ~104 K |
Ag-SnO2 coatings, Thickness: NR, Crystallite size: 20–40 nm, Microstructure: Ag matrix with inclusions of SnO2, Ag3Sn, Ag4Sn, Cu6Sn5, Cu10Sn3, Cu3Sn, and CuO (20–50 nm) |
[39] |
| Ag foil (99.9%) filled with a TiB2 powder (0.2 g) |
Cu substrates (grade M00) |
Plasma action time: ~100 μs, Absorbed power density on the jet axis: ~5.5 GW/m2, Shock-layer pressure (near surface): ~12.5 MPa, Residual gas pressure in the working chamber: ~100 Pa, Plasma temperature at the nozzle exit: ~104 K |
Ag-TiB2 coatings, Thickness: 100 μm, Morphology: coarse (3–50 µm) and fine droplets (< 1 µm), Microstructure: Ag matrix with different phase composition (TiB, Cu2O, Cu, Cu4Ti3, AgTi, B2O3, B2O) and pore sizes: ~0.36–2 µm |
[41] |
| Ag-4 wt.% graphite (C) powder mixture (particle size: ≤ 32 μm) |
Cu plates (20 × 20 × 3 mm3) |
Base pressure: 10 Pa, Process gas: Ar gas, Spraying pressure: 1.5 × 105 Pa, Initial charging voltage U0: 11–14 kV, Ag-C powder amount/ single spraying: 50 mg, Stand-off distance: 18 mm |
Ag/C coatings, Thickness: 20–50 μm, Coating area/single spraying: 39.25 mm2 at 13 kV, 102 mm2 at 11 kV, Deposition efficiency: 23–35%, Adhesion: good (metallurgical bonding) |
[26] |
|
Coating/ Substrate Type (Deposition Technique) |
Thick- ness (μm) |
Surface Rough- ness Ra (nm) |
Vickers Hard- ness HV |
Bonding Force (N)/ Strength (MPa) |
Electrical Conduc-tivity (MS/m) |
Coefficient of Friction (Dry Sliding) |
Wear Rate (mm3/N⋅m) |
Electrical Contact Resistance (mΩ) |
References |
| Ag/Cu (EP) | 5.27 | – | 88.1 | – | ~32.2 | 0.79 | 8.64 × 10−6 | – | [23] |
| Ag-2 wt.% Sb/Cu (EP) |
5.66 | – | 146.5 | – | ~6.0 | 0.56 | 0.84 × 10−6 | – | [23] |
| Ag-2.72 wt.% Sb/Cu (EP) |
5.54 | – | 140.0 | – | ~4.1 | 0.69 | 4.51 × 10−6 | – | [23] |
| Ag/Cu (EP) | – | – | 60.4 | – | ~55.6 | 0.60 | – | – | [63] |
| Ag-1.2 vol.% CNT/Ag/Cu (EP) | – | – | 63.2 | – | ~52.6 | 0.40–0.50 | – | – | [63] |
| Ag-G/Cu (EP, 0.5 g/L G) |
13–16 | 300 | 120 | – | – | 0.54 | – | [44] | |
| Ag/Cu (EP) |
40.6 | 62.9 | 99.2 | – | – | 0.72 (CCF, 5 A) |
– | 8–60 (CCF, 5 A) |
[46] |
| Ag-G/Cu (DPEP, 2 g/L G) |
41.5 | 41.3 | 161.93 | – | – | 0.41 (CCF, 5 A) |
– | 10 (CCF, 5 A) |
[46] |
| Ag-G/Cu (DCEP, 2 g/L G) |
46.8 | 92.3 | 122.04 | – | – | 0.63 (CCF, 5 A) |
– | 6–20 (CCF, 5A) |
[46] |
| Ag/Cu (EP) |
13.8 | 26.1 | 92 | – | – | 0.650 | – | 92 (CCF, 5 A) |
[66] |
| Ag-G/Cu (DPEP, 0.75 g/L G) | 13.7– 16.1 |
25.5 | 144.1 | – | – | 0.506 (CCF, 5 A) |
– | 30 (CCF, 5 A) |
[66] |
| Ag/Inconel 718 (MS) |
3.75 | – | 135 | 23 N | – | 0.56–0.80 | 3.1– 4.4 × 10−6 |
– | [17] |
| Ag/steel (CS) |
650 ± 25 | 6900 ± 790 |
112– 133 |
– | 35–43 | – | – | – | [53] |
| Ag/Ni/steel (CS) |
300/ 100 |
4170 ± 1310 |
116.2/ 172.5 |
– | – | – | – | – | [101] |
| Ag/CoNiCrAlY/ steel (CS) |
200/ 100 |
4590 | ~144 | 27.5 MPa | – | – | – | – | [102] |
| Ag-13.8 wt.% Ni/Cu (CS) |
2000 | – | 95 (CM) |
– | – | – | – | – | [121] |
| Ag-21 wt.% Ni/Cu (CS) |
2000 | – | 130 (FM) |
– | – | – | – | – | [121] |
| Ag-21 wt.% Ni/Cu (CS) |
2000 | – | 95 ± 2.7 (CM) |
– | – | – | – | – | [122] |
| Ag-2.6 wt.% SnO2/Cu (CS) |
2000 | – | 151 ± 1.5 |
– | – | – | – | – | [122] |
| Ag-5% C/Cu (CS) | 60 | – | – | ~38.5 | – | – | – | [25] | |
| Ag-SnO2/Cu (CS) |
3000 | – | 125 | 9.5– 26 MPa |
– | – | – | – | [123] |
| Ag-SnO2/Cu (APS) | 600 | – | 109 | 17.9 MPa | – | – | – | [124] | |
| Ag-W/Cu (EES) |
~49–69 | 75.412 | 382– 457.5 |
– | – | – | – | – | [34] |
| Ag-CuO/Cu (EES) |
75–95 | 73 | – | – | – | – | – | 0.004– 0.016 |
[35] |
| Ag-ZnO/Cu (EES) |
30–60 | – | – | – | – | – | – | 0.003– 0.014 |
[40] |
| Coating/Substrate Type (DepositionTechnique) |
Key Performance Findings |
Dominant Mechanisms |
References |
| 5.27–40.6 μm thick Ag/Cu (Electroplating) |
High conductivity (~32.2–55.6 MS/m), low hardness (~60–99 HV), high friction (COF: ~0.6–0.8), and lower wear resistance than Ag-based composite coatings |
Soft FCC Ag metal, adhesive wear, plastic deformation |
[23,46, 63,66] |
| 5.5–5.7 μm thick Ag-2–2.72 wt.% Sb/Cu (Electroplating) |
Lower electrical conductivity (~4.1–6 MS/m), higher hardness (~140–146.5 HV), and improved tribological behavior (COF = 0.56–0.69) compared with 5.27 μm thick Ag coatings (~32.2 MS/m, 88.1 HV, COF = 0.79) |
Solid-solution strengthening, electron scattering, abrasive and adhesive wear, plastic deformation | [23] |
| Ag-1.2 vol.% CNT/Ag/Cu (Electroplating) |
Slightly lower conductivity (~52.6 MS/m), higher hardness (~63.2 HV), lower friction (COF: ~0.4–0.5), and improved wear resistance compared with pure Ag coatings (~55.6 MS/m, 60.4 HV, COF: ~0.6) | Load transfer strengthening, CNT-based solid lubrication, lubricious tribofilm formation |
[63] |
| Ag-G/Cu (EP, 0.5–2 g/L G) |
Higher hardness (~120–122 HV), lower (COF: 0.54–0.63), and lower ECR (6–30 mΩ) under dry sliding and current-carrying friction (CCF, 5 A) than pure Ag coatings (92–99 HV, COF: ~0.65–0.72, ECR: 8–92 mΩ) | Load transfer strengthening, graphene-based solid lubrication, lubricious tribofilm formation | [44,46, 66] |
| Ag-G/Cu (DPEP, 0.75–2 g/L G) |
Finer grains, higher hardness (~144–162 HV), lower friction (COF: ~0.41–0.51), and lower ECR (10–30 mΩ) under dry sliding and CCF (5 A) than pure Ag coatings | Pulsed nucleation, graphene-based solid lubrication |
[46,66] |
| (3.75 μm thick Ag/Inconel 718 (Magnetron sputtering) |
Enhanced mechanical and tribological performance at RT (~135 HV, COF: ~0.56–0.8, WR: 0.31–0.44 × 10−5 mm3/N·m, adhesion: 23 N) and HT (~84 HV, COF: ~0.3–0.5, WR: 0.17–0.25 × 10−5 mm3/N·m, adhesion: 16 N) | Mechanical mixing, diffusion bonding, abrasive wear at RT, abrasive and adhesive wear at HT |
[17] |
| 650 ± 25 μm thick Ag/steel (Cold spraying) |
High electrical conductivity (35–43 MS/m), high hardness (112–133 HV), and low porosity (0.1–0.32%) |
Lamellar splat structure, mechanical interlocking at the interface |
[53] |
| Ag/bond layer (Ni, CoNiCrAlY)/steel (Cold spraying) |
Very thick coatings (200–300 µm), high hardness (116–144 HV), and high bonding strength (27.5 MPa) |
Lamellar splat structure, enhanced interfacial bonding |
[101,102] |
| 2 mm thick Ag-Ni/Cu (Cold spraying) |
Higher hardness (130 HV) for fine microstructure than coarse microstructure (~95 HV), low porosity (< 1%), and good erosion resistance | Dispersion strengthening, grain boundary pinning |
[121,122] |
| 0.6–3 mm Ag-SnO2/Cu (CS/APS) | High hardness (109–153 HV), improved wear resistance, and good erosion resistance | Work hardening, dispersion strengthening | [122,123,124,129] |
| 60 μm thick Ag-C/Cu (Cold spraying) |
High conductivity (~32.2–55.6 MS/m) and good arc erosion resistance under DC switching |
Graphite-based solid lubrication |
[25] |
| 49–69 μm thick Ag-W/Cu (EES) |
Very high hardness (382–457.5 HV), Multilayer structure consisting of a dense surface layer, a liquid-phase alloyed layer, and a heat-affected zone |
Rapid solidification, nanocrystalline structure, tribo-oxide film formation |
[34] |
| 75–95 μm thick Ag-CuO/Cu (EES) |
Ag matrix containing CuO inclusions (2–500 nm), enhanced service life, and very low contact resistance (4–15.7 μΩ) |
Rapid solidification, nanocrystalline structure, tribo-oxide film formation | [35] |
| 30–60 μm thick Ag-ZnO/Cu (EES) |
Ag matrix containing ZnO inclusions (2–15 nm), enhanced service life, and very low contact resistance (4–15.7 μΩ) |
Rapid solidification, nanocrystalline structure, tribo-oxide film formation |
[40] |
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