Submitted:
15 July 2025
Posted:
16 July 2025
You are already at the latest version
Abstract
Keywords:
1. Introduction
2. Graphene Synthesis

2.1. Top Down
2.1.1. Mechanical Exfoliation
Micromechanical Cleavage
Sonication
Ball Milling
Fluid Dynamics
Supercritical Fluids
Detonation Technique
2.2. Oxidation-Reduction
2.2.1. Oxidation Method
2.2.2. Chemical Oxidation
Thermal Oxidation
Electrochemical Oxidation
Reduction Method
Chemical Reduction
Thermal Reduction
Electrochemical Reduction
2.2.3. Arc Discharge Method
Effect of Buffer Gas Type
Effect of Current Type
Effects of Pressure
Effect of Reaction Temperature
Effect of Reaction Time
Effect of Chamber Type
2.2.4. Unzipping of Carbon Nanotube
Oxidative Zipper Retraction
Catalytic Zipper Opening
Electrochemical Zipper Opening
Sonochemical Zipper Opening
2.2.5. Liquid Phase Exfoliation
Graphite Intercalation Compounds (GIC)
Chemical Exfoliation with Organic Solvents
Chemical Exfoliation with Ionic Liquid Exfoliation
Chemical Exfoliation with Surfactants
Exfoliate with Low Boiling Point Solvent
Exfoliation with Electrochemistry
2.3. Bottom up
2.3.1. Chemical Vapor Deposition (CVD)
Temperature
Pressure
Wall/Substrate
Deposition Time
Gas Flow State
Activated Manner
2.3.2. Epitaxial Growth of Graphene Silicon Carbide
Surface
Temperature
Pressure
Catalyst
3. Conclusions
Author Contributions
Funding
Institutional Review Board Statement
Informed Consent Statement
Data Availability Statement
Conflicts of Interest
Abbreviations
| PMMA | Polymethyl methacrylate |
| PDMS | Polydimethylsiloxane |
| FTIR | Fourier Transform Infrared |
| SEM | Scanning Electron Microscopy |
| XRD | X-ray Diffraction |
| AFM | Atomic Force Microscopy |
| TEM | Transmission Electron Microscopy |
| DMF | Dimethylformamide |
| NMP | N-Methyl-2-pyrrolidone |
| SC | Supercritical |
| RDX | Research Department Explosive |
| ER-GO | Explosively Reduced Graphene Oxide |
| SEG | Solvent-Exfoliated Graphene |
| SDOC | Sodium Deoxycholate |
| SDBS | Sodium Dodecylbenzenesulfonate |
| SDS | Sodium Dodecyl Sulfate |
| HTAB | Hexadecyltrimethylammonium Bromide |
| CG | Concentration of Graphene |
| Csur | Concentration of Surfactant |
| CMC | Critical Micelle Concentration |
| APCVD | Atmospheric Pressure Chemical Vapor Deposition |
| LPCVD | Low Pressure Chemical Vapor Deposition |
| PECVD | Plasma Enhanced Chemical Vapor Deposition |
| TCVD | Thermal Chemical Vapor Deposition |
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| Methods | FTIR | SEM | Raman | XRD | Ref. |
| Sonication during oxidation (Hummers method) | Decrease in O–H and C=O functional groups due to strong sonication | Flexible sheet structure with lower oxidation | Increased (many defects) | Intense (002) peak at 2θ = 26.5°, indicating dominant graphite phase | [26] |
| Sonication for 1–5 hours (with Tween 80) | – | Lateral size decreased from ~5 μm to 317 nm | Ratio increased gradually with longer sonication time | – | [27] |
| Sonication for 10/20 minutes (30/50 W) | O–H and COOH peak intensities decreased (sample S1 to S4) | Morphology becomes increasingly deformed (S1 to S4) | Increased from 0.84 to 0.95, indicating increased structural disorder | (002) peak shifted from 2θ = 11.34° to 11.14° | [28] |
| Sonication for 15–45 minutes (electrochemical method) | Appearance of C–O–H vibration, indicating the presence of hydroxyl group | – | – | (002) peak intensity weakened; crystallite size decreased | [29] |
| Sonication for 8.5 hours (ethanol: water = 20:80) | Peaks observed O–H, C=C, and C–H | Spherical morphology with particle size ~23–41 nm | ID/IG ratio approximately 0.65, suggesting a moderate level of defects | Broad (002) peak at 2θ ~25°; crystallite size ~20 nm | [30] |
| Wet Ball-Mill Method | |||||
| Sample | FTIR | Morphology (SEM/TEM) | Raman (ID/IG) | XRD | Ref. |
| Graphite + DMF | C=O stretching (~1700 cm⁻¹) | Thin sheets with folded edges; few-layer structure (0.8–1.8 nm) | Increased, indicating higher disorder due to milling | (002) peak broadened | [34] |
| Graphite + Water + KClO₄ | C–O stretching (~1060 cm⁻¹) | Small layered nanosheets, graphene oxide (GO) formed | Increased with longer milling time | (002) peak broadened | [31] |
| Graphite + Water | C=O functional group observed | Large aggregates (BOTTOM60), finer sheets (TOP60); few-layer structure | High value (TOP60), suggesting a small sheet size and more defects | - | [35] |
| Graphite + Ethanol: Water (7:3) | - | Graphene-encapsulated SiC; few-layer structure | Decreased with increasing speed, indicating improved quality | Graphite peak intensity decreased | [36] |
| Graphite + Water | - | More uniform particles; presence of individual sheets | Lowest value at 500 rpm (0.221), indicating high-quality graphene | (002) peak became sharper | [37] |
| Dry Ball-Mill Method | |||||
| Sample | FTIR | Morphology (SEM/TEM) | Raman (ID/IG) | XRD | Ref. |
| Graphite | - | Nanoparticles with irregular shapes | Increased, suggesting greater defect formation | Crystallinity decreased (weakened graphite peak) | [38] |
| Graphite | C=O, C–O functional groups | Shaft-like structure with reduced particle size | Increased, reflecting higher structural disorder | Graphite peak intensity decreased | [39] |
| Graphite | C=O, OH, COOH groups | Thin sheets with open structure; <10 layers | Increased, indicating defect generation during milling | Graphite peaks broadened | [40] |
| Graphite | OH, C=O groups | Rough surface morphology; reduced particle size | Increased (from 0.21 to 0.97), supporting oxidation process | 2θ peaks shifted and broadened | [41] |
| Graphite | - | Thin and layered flake morphology | - | 2θ peaks shifted and broadened | [32] |
| Parameters | VFD | PFD | MFD |
| Thickness | Ranges from < 1 nm to > 20 nm | Up to 79% ≤ 1.5 nm (after 8 hours at 15 MPa) | Average ~1.5 nm; up to 92% ≤ 1.5 nm (after 3 hours) |
| Number of Layers | 1 to > 20 layers | ≤ 5 layers: 29% (0.5 h), 63% (4 h), 79% (8 h) | Average < 5 layers; stable across various exfoliation durations |
| Lateral Size / Area | < 1 μm | Over 85% of flakes < 0.1 μm² (after 8 hours) | Average ~320 nm (AFM); ~0.5 μm (Raman in protein medium) |
| Thickness Distribution | Uneven; limited data available | Becomes thinner and more uniform over time | Remains stable around 1.5 nm; shifts toward thinner layers |
| Defect (Raman/XPS) | Minimal defects | Low defect levels, mainly at the edges | Very low defect levels; basal planes largely defect-free |
| Sample | AFM | Raman | XRD | Ref. |
| Graphite + SC-CO₂ | >10 layers | Weak 2D peak; high ID/IG ratio indicating limited exfoliation | Intense (002) peak with slight broadening, indicating minor delamination | [47] |
| Graphite + SC-CO₂ | Majority <3 layers (yield ~28%) | 88% <3 layers; sharp 2D peak confirms few-layer graphene | Clear graphene structure; no signs of oxidation | [48] |
| Graphite + SC ethanol | ~1.0–1.2 nm thickness; 6–10% monolayer content; stable | Low ID/IG ratio (~0.17); symmetric 2D peak at 2684 cm⁻¹ | (002) peak intensity decreased; increased interlayer spacing | [49] |
| Graphite + SC ethanol | Few layers (maximum yield ~18.5%) | Slight increase in ID/IG ratio; minor defects introduced | Decrease in (002) peak intensity; successful exfoliation | [50] |
| Methods | TEM | Raman (ID/IG) | XRD (2θ) | Ref. |
| C₂H₂ + O₂ gas detonation (ratio 0.4–0.8) | 2–3 layers; monolayers observed; lateral size increases with higher O₂ ratio | Decreases from ~1.33 to ~0.28, indicating reduced defects and improved crystallinity | (002) peak at 26.05°, close to graphite (26.6°), indicating preserved graphite structure | [53] |
| O₂/C₂H₂ detonation (O/C ratio 0.25–0.75) | 8–30 layers; turbostratic structure; lateral size 20–200 nm | Decreases when O/C > 0.5, suggesting fewer defects and a more ordered structure | (002) peak shifts from 25.33° to 25.74°, lower than graphite, indicating increased interlayer spacing | [52] |
| Solid explosive: CaCO₃ + Mg + RDX | <10 layers; transparent and crumpled sheets | ~0.26, indicating very few defects and high-quality graphene | (002) peak at 26.04°, close to graphite, suggesting good crystallinity | [51] |
| GO to ER-GO (thermal reduction at 100°C) | Thin, transparent sheets | No numerical value reported; D and G bands are present, indicating moderate defect density | GO: 7.9° (d ≈ 1.09 nm); ER-GO: approximately 26.3°, indicating partial restoration of graphite-like structure | [54] |
| Oxidation | Reduction | FTIR | Raman (ID/IG) | XRD | Ref. |
| Thermal | Thermal | High intensity of –OH, C=O, and C–O functional groups | Decreases with increasing temperature and time | (002) peak at 26.5°, interlayer spacing d ≈ 3.36 Å | [75] |
| Chemical (Hummers) | Chemical (NaBH₄) | High –OH and C=O intensity; epoxy group is reduced | 0.98 | Interlayer spacing d = 0.388 nm; average number of layers ≈ 1.4; crystallite size ≈ 22 nm | [70] |
| Electrochemical | Chemical (hydrazine) | Presence of –OH, C–O–C, C–C, and C=O groups | 0.849 | 2θ = 26.52°; grain size ≈ 23 nm | [76] |
| Chemical (Hummers) | Electrochemical | Decrease in –OH, C=O, and C–O functional groups | 1.24 | Interlayer spacing d = 0.3554 nm | [77] |
| Chemical (Hummers) | Chemical (Ascorbic acid) | Decrease in C=O, C–OH, and C–O–C; partial restoration of sp² structure | Decreases from 0.805 to 0.788 with increasing temperature | GO peak at ~11.9°; rGO peaks between 24.8° and 25.2°; d-spacing ≈ 3.55 Å | [78] |
| Chemical (Hummers) | Chemical (hydrazine) | C=O and C–O functional groups are reduced | 2.23 | GO: ~10.9° (001); rGO: ~26.4° (002); interlayer spacing decreases | [79] |
| Chemical (Hummers) | Thermal | C=O and C–OH groups are reduced | - | GO: ~10.5°; rGO: 24.7° to 26.2°; d-spacing for GO ≈ 0.84 nm; for rGO ≈ 0.34–0.36 nm | [80] |
| Chemical (Hummers) | Chemical (Zn metal) | Decrease in C–O–C, C–OH, and C=O groups; oxygen-containing groups are weakened | 1.01 | GO (002) peak at ~26°; additional ZnO peak with wurtzite structure observed | [81] |
| Types of Gas | Result | Ref. |
| Ar | ~12% graphene sheets comprising 1–10 layers; interlayer spacing of 0.34–0.39 nm | [85] |
| Ar | High-quality, very pure 4-layer graphene | [86] |
| H2 | 2–4-layer graphene, free of nanotube contaminants | [87] |
| H2-N2 | Up to 5 layers of graphene, low defect density, suitable for mass production | [88] |
| Aspects | Air conditioning | DC | Ref. |
| Structure | Nanohorns, carbon onions, 1–5 layers of graphene | Carbon nanotubes, 2–4 layers of graphene | [89],[88],[86],[87] |
| Purity | Very pure; minimal carbon contamination | Less pure; mixed with non-graphitic carbon | [89], [86] |
| Process & Control | Flexible, frequency-controlled process | Less flexible; dependent on gas, metal catalyst & pressure | [89],[90],[91] |
| Graphene Quality | Low defects, optimal with N₂/H₂ mixture | Minimal defects, optimal with argon gas | [88],[86] |
| Scalability | Large-scale, suitable for industry | Suitable for small–to medium-scale and specialized applications | [88],[91] |
| Efficiency & Results | High efficiency when optimizing gas composition & frequency | Generally lower efficiency than the air-conditioning method | [88],[90] |
| Pressure | Number of Layers | Purity | Ref. |
| Low | Formation of nanohorns and nanospheres, no coated graphene layers | Low purity, a hybrid of various carbon nanostructures | [92] |
| Moderate | Approximately 4-layer graphene, thermally and structurally stable | High purity, well-ordered structure without toxic intercalates | [86] |
| High | Graphene with 2–10 layers, pronounced condensation observed | High purity, uniform, defect-free graphene structure | [92] |
| Temperature | Number of Layers | Purity | Ref. |
| Low | Single-layer graphene grown at low energy | High purity, low-carbon atomic mobility, minimal defects | [93] |
| Moderate | 2–4 layer graphene with balanced growth energy | High purity, stable plasma, minimal fouling | [86], [87] |
| High | > 4-layer graphene; rapid growth due to high energy | Lower purity, increased mobility lead to more defects and contamination | [93], [94] |
| Duration | Number of Layers | Purity | Ref. |
| Short | 2–4 layer graphene | High purity; slightly distorted structure | [87], [95] |
| Moderate | 4–6 layer graphene | High purity; some layer non-uniformity and minor structural flaws | [82], [94] |
| Long | Up to ~20 layers graphene | Decreased purity; more defects, mitigable with buffer gas | [83] |
| Chamber Type | Number of Layers | Purity | Ref. |
| Closed chamber | Approximately 4 layers of graphene | High purity, minimal defects | [82],[86] |
| Semi-open chamber | Moderate, depending on parameters | Moderate purity, possible contamination | [82] |
| Open chamber | Multilayer graphene (many layers) | Low purity, high defect density | [96] |
| Method | Number of Layers | Purity | Ref. |
| Oxidative | Single to multi-layer graphene | Multiple defects; presence of oxygen-containing functional groups | [100],[106],[107] |
| Catalytic | 4 – 8 layers graphene | Slight defects, traces of residual metal catalyst | [103] |
| Electrochemical | Single to multi-layer graphene | High purity, minimal defects | [108] |
| Sonochemistry | Predominantly bilayer graphene, with some monolayer | Smooth edges, low interference | [109] |
| Ionic Liquids | SEG (mg/mL) | Number of Layers |
| [C₄C₁im][Ntf₂] | ~1.8 | ≤5 |
| [Pyrr₄,₁][Ntf₂] | ~1.8 | ≤5 |
| [N₄,₁,₁,₁][Ntf₂] | ~1.8 | ≤5 |
| [C₁₀C₁im][Ntf₂] | <1.8 | ≤5 |
| [BnzmC₁im][Ntf₂] | <1.8 | ≤5 |
| [C₄C₁im][C(CN)₃] | <0.5 | >30 |
| [C₂C₁im][N(CN)₂] | <0.5 | ≤5 |
| [C₄C₁im][C₁SO₄] | <0.5 | ≤5 |
| [C₂C₁im][OTF] | <0.5 | <5 |
| Surfactant | CG Max (mg/mL) | Optimal Csur (mg/mL) | CMC (mg/mL) |
| SDOC | ~0.10 | ~1.0 | 5.0 |
| SDBS | ~0.11 | ~0.7 | 0.7 |
| SDS | ~0.09 | ~2.0 | 2.3 |
| HTAB | ~0.12 | ~0.3 | 0.33 |
| Tween 80 | ~0.08 | ~0.015 | 0.0157 |
| Triton X-100 | ~0.29 | ~1.0 | 0.343 |
| Solvent | Boiling Point (°C) | Concentration (mg/mL) | Result |
| Acetone | 56 | ~0.08 | Low concentration, suitable for low-boiling dispersion. |
| Chloroform | 61 | ~0.5 | Stable (≥75 % remains suspended after 100 h), produces medium-sized flakes. |
| Isopropanol | 82 | ~0.5 | Highly stable (>90% fixed suspended >200 hours); produces good quality flakes |
| Cyclohexa-none | 156 | ~1.0 | Effectively exfoliates graphene; high boiling point makes solvent removal challenging. |
| NMP | 204 | ~1.0 | Effectively exfoliates graphene; high boiling point makes solvent removal challenging. |
| DMF | 153 | ~1.0 | Effectively exfoliates graphene; high boiling point makes solvent removal challenging. |
| CVD Temperature | Layers | Defects | Substrate Interactions | Ref. |
| Low | Slow film growth, non-uniform coverage | High defects, insufficient energy | Weak interactions, delamination potential. | [132] |
| High | Fast carbon diffusion, uniform and continuous graphene film | Reduced defects, more perfect structure | Strong interaction, adhesion and stability are better. | [133], [134] |
| Ultra-High | Rapid growth, increased film thickness | Further reduced defects, though new defects may emerge | Potential substrate etching and adverse interactions | [135],[136] |
| CVD Pressure | Coating & Uniformity | Defects | Substrate Interactions | Ref. |
| APCVD | Large area, fairly uniform, limited control | High defect, decreased purity | Strong substrate interaction, difficult to transfer | [138],[133] |
| LPCVD | Uniform, high-quality monolayer | Low defects, high purity | Weak interaction, easy to transfer | [139] |
| Ultra-Vacuum | Highly uniform, high precision | Very low defects, optimal purity | Minimal interaction, ideal for transfer | [140] |
| Aspects | Cold Wall CVD | Hot Wall CVD | Ref. |
| Number of Layers | Uniform and thin layer formation | Thicker layers, less uniform | [142],[143] |
| Defects | Low defects, high purity | Higher defect density, reduced purity | [142],[144] |
| Substrate Influence | Better process control, high-quality graphene | Greater substrate influence; increased defect formation | [145],[133] |
| CVD Method | Coating & Uniformity | Defects | Ref. |
| Continuous | Uniform, suitable for large areas | Low defect density, high material purity | [146],[147] |
| Diconected | Less uniform | Higher defect density, lower purity | [148] |
| Pulsed | Controlled and tunable deposition | Low defect density, high material purity | [135],[136] |
| CVD System | Gas Flow & Dynamics | Defects & Purity | Scalability | Ref. |
| Open | Continuous flow (methane, H₂), stable reaction | Slight defects, high purity | Suitable for large-scale, even gas distribution | [138] |
| Closed | Static gas, layer growth control | High crystallinity & purity, sensitive to reaction conditions | Less suitable for large-scale use without process optimization | [150] |
| Method | Defects & Purity | Layer | Efficiency | Ref. |
| PECVD | Low defects, high purity | SLG–FLG (dependent on parameters) | Fast, low temperature, suitable for large-scale | [152],[153], [154],[155] |
| TCVD | Higher defect density; RT-CVD offers improvement | Generally monolayer | Slow, high temperature, RT-CVD is more efficient | [156] |
| Laser-CVD | Low defects with precise control | Multi-layer (dependent on laser parameters) | Fast, ideal for specific patterns | [157] |
| Parameters | Si-face | C-Face |
| Number of layers | 1–2 layers (monolayer) | Up to ~30 layers (multilayer) |
| Raman Spectrum | ID/IG < 0.02 (sharp G and 2D peaks) | ID/IG < 0.05, broader peaks with creases |
| Electron mobility | Relatively low | Relatively high |
| Temperature | Number of Layers | Electron Mobility | Description |
| Low | 0 – 0.6 layers | Very low (up to 81 cm²/Vs) | Graphene is not fully formed; significant exposure of SiC surface remains |
| Optimal | ~1.2 – 1.4 layers | Highest (~370 cm²/Vs) | Nearly monolayer graphene, maximum mobility, uniform surface morphology |
| High | >1.6 layers | Decreasing (up to 77 cm²/Vs) | Multilayer graphene, presence of grain boundaries and "giraffe stripe" patterns |
| Pressure | Raman | Surface Morphology | Graphene Quality |
| Low Pressure (∼10⁻⁷ mbar) | Weak G and 2D bands, dominant D band | Rough surface with many defects | Low-quality, non-uniform graphene |
| Inert Atmosphere (∼10⁻³ mbar) | Strong G and 2D bands, D band nearly absent | Smooth surface with uniform morphology | High-quality, thin, and uniform graphene layers |
| Method | Number of Layers | Raman | Surface Morphology | Graphene Quality |
| No Catalyst | 6–7 layers | G and 2D wideband, ID/IG > 0.4 | Rough surface, many defects, non-uniform | Low-quality, multilayer graphene with small crystallite |
| With Ni–Cu Catalyst | Monolayer | G and 2D sharp band, ID/IG ~0.24, 2D > G | Smooth surface, uniform morphology | High quality, uniform monolayer graphene with large crystallites (35–60 nm) |
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