Li, P.; Lei, Q.; Zhang, H.; Qi, M.; Song, J.; Lian, P.; Cheng, J.; Wang, Q.; Tang, Z.; Liu, Z. Measurement of the Diffusion Coefficient of Xenon in Self-Sintered Nanopore Graphite for Molten Salt Reactor. C2023, 9, 113.
Li, P.; Lei, Q.; Zhang, H.; Qi, M.; Song, J.; Lian, P.; Cheng, J.; Wang, Q.; Tang, Z.; Liu, Z. Measurement of the Diffusion Coefficient of Xenon in Self-Sintered Nanopore Graphite for Molten Salt Reactor. C 2023, 9, 113.
Li, P.; Lei, Q.; Zhang, H.; Qi, M.; Song, J.; Lian, P.; Cheng, J.; Wang, Q.; Tang, Z.; Liu, Z. Measurement of the Diffusion Coefficient of Xenon in Self-Sintered Nanopore Graphite for Molten Salt Reactor. C2023, 9, 113.
Li, P.; Lei, Q.; Zhang, H.; Qi, M.; Song, J.; Lian, P.; Cheng, J.; Wang, Q.; Tang, Z.; Liu, Z. Measurement of the Diffusion Coefficient of Xenon in Self-Sintered Nanopore Graphite for Molten Salt Reactor. C 2023, 9, 113.
Abstract
The economics and safety of reactors can be affected by the diffusion of fission products into graphite. Xenon (Xe) fission products diffusing into the graphite is the most critical neutron absorber and poison that can slow down or stop the chain reaction. The transport parameters for inhibiting the xenon diffusion in graphite are therefore the utmost scientific problem. Self-sintered nanopore-isotropic (~ 40nm) graphite (SSNG) derived from green pitch coke can decrease Xe diffusion into the graphite. In this study, a method for measurement of diffusion coefficients of fission products diffusion in graphite by Rutherford backscattering spectrometry (RBS) was reported. The SSNG substrates were implanted with Xe at a dose of 4.8×1015 ions/cm2 and energy of 7 MeV. The RT-implanted samples were annealed in a vacuum at 650°C for 9 h. The implanted and annealed samples were characterized by RBS. The diffusion coefficient D(Xe,650°C) is 6.49×10-20 m2/s. The results indicate the excellent ability to inhibit Xe diffusion of the SSNG and present significance in designing and evaluating the safety of nuclear reactors.
Keywords
Diffusion; Graphite; Fission products; Ion implantation; RBS
Subject
Chemistry and Materials Science, Materials Science and Technology
Copyright:
This is an open access article distributed under the Creative Commons Attribution License which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited.
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