Gutowski, P.; Sankowska, I.; Bugajski, M.; Sobczak, G.; Kuźmicz, A.; Pierściński, K. Calibration Technique for MBE Growth of Long Wavelength InAlAs/InGaAs Quantum Cascade Lasers. Crystals2023, 13, 1341.
Gutowski, P.; Sankowska, I.; Bugajski, M.; Sobczak, G.; Kuźmicz, A.; Pierściński, K. Calibration Technique for MBE Growth of Long Wavelength InAlAs/InGaAs Quantum Cascade Lasers. Crystals 2023, 13, 1341.
Gutowski, P.; Sankowska, I.; Bugajski, M.; Sobczak, G.; Kuźmicz, A.; Pierściński, K. Calibration Technique for MBE Growth of Long Wavelength InAlAs/InGaAs Quantum Cascade Lasers. Crystals2023, 13, 1341.
Gutowski, P.; Sankowska, I.; Bugajski, M.; Sobczak, G.; Kuźmicz, A.; Pierściński, K. Calibration Technique for MBE Growth of Long Wavelength InAlAs/InGaAs Quantum Cascade Lasers. Crystals 2023, 13, 1341.
Abstract
In this paper we present methodology for precise calibration of Molecular Beam Epitaxy (MBE) growth process and achieving run to run stability of growth parameters. We present the analysis of the influence of fluxes stability during the growth of long wavelength quantum cascade laser structures designed for the range λ ~ 12–16 µm on wavelength accuracy with respect to desired emission wavelength. The active region of the lasers has a complex structure of nanometer thickness InxGa1-xAs/InyAl1-yAs superlattice. As a consequence, the compositional and thickness control of the structure via bulk growth parameters is rather difficult. To deal with this problem we employ methodology based on double-superlattice test structures, that precede the growth of the actual structures. The test structures are analyzed by high-resolution X-ray diffraction which allows to calibrate the growth of the complex active region of quantum cascade laser structures. We also study theoretically the effect of individual flux changes on emission wavelength and gain parameters of the laser. The results of simulations allow for determination of flux stability tolerance, preserving acceptable parameters of the laser and provide means of emission wavelength control. The proposed methodology was verified by the growth of laser structures for emission at around 13.5 μm.
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This is an open access article distributed under the Creative Commons Attribution License which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited.
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