Preprint Article Version 1 Preserved in Portico This version is not peer-reviewed

Crystalline Flat Surface Recovered by High Temperature Annealing after Laser Ablation

Version 1 : Received: 25 March 2023 / Approved: 29 March 2023 / Online: 29 March 2023 (11:50:37 CEST)

A peer-reviewed article of this Preprint also exists.

Smith, D.; Ng, S.H.; Tang, A.; Katkus, T.; Moraru, D.; Juodkazis, S. Crystalline Flat Surface Recovered by High-Temperature Annealing after Laser Ablation. Photonics 2023, 10, 594. Smith, D.; Ng, S.H.; Tang, A.; Katkus, T.; Moraru, D.; Juodkazis, S. Crystalline Flat Surface Recovered by High-Temperature Annealing after Laser Ablation. Photonics 2023, 10, 594.

Abstract

Ultra-short laser pulses (1030 nm/230 fs) were used to laser ablate surface of crystalline sapphire. Laser ablated patterns were annealed at high temperature 1500∘C. Surface reconstruction took place removing ablation debris field at the edges of ablated pits in oxygen flow. Partial reconstruction of ripples was also observed.

Keywords

ablation; light-matter interaction; femtosecond lasers; nanoscale; high temperature annealing

Subject

Chemistry and Materials Science, Materials Science and Technology

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