Working Paper Article Version 1 This version is not peer-reviewed

Fabrication of Ultralow Stress Optical Coatings by Plasma Ion-assisted Deposition

Version 1 : Received: 16 July 2020 / Approved: 17 July 2020 / Online: 17 July 2020 (09:27:49 CEST)

A peer-reviewed article of this Preprint also exists.

Guo, C.; Kong, M. Fabrication of Ultralow Stress TiO2/SiO2 Optical Coatings by Plasma Ion-Assisted Deposition. Coatings 2020, 10, 720. Guo, C.; Kong, M. Fabrication of Ultralow Stress TiO2/SiO2 Optical Coatings by Plasma Ion-Assisted Deposition. Coatings 2020, 10, 720.

Journal reference: Coatings 2020, 10, 720
DOI: 10.3390/coatings10080720

Abstract

Optical and mechanical properties of multilayer coatings depend on the selected layer materials and the deposition technology; therefore, knowledge of the performances of thin films is essential. In the present work, titanium dioxide (TiO2) and silicon dioxide (SiO2) thin films have been prepared by plasma ion-assisted deposition (PIAD). The optical, structural, and mechanical properties of thin films have been investigated using spectrometer/ellipsometer, X-ray diffraction (XRD), atomic force microscopy (AFM), and laser interferometer. The results show that TiO2 film fabricated by PIAD induces a high refractive index, wide optical band gap, amorphous structure, smooth surface, and tensile stress. In the case of SiO2 film, high bias voltage leads to dense structure and compressive stress. As an application, a three-wavelength high reflectance at 632.8, 808, and 1550nm is optimized and deposited. The dependence of total stress in the multilayer on the substrate temperature is studied as well. In conclusion, it is demonstrated that PIAD is an effective method for the preparation of ultralow stress TiO2/SiO2 multilayer films. The achieved stress is as low as 1.4Mpa. The result could provide guidance to the stress optimization of most optical components without prefiguring, backside coating, and post-deposition treatments.

Subject Areas

stress; plasma ion-assisted deposition; TiO2 film; SiO2 film; annealing treatment.

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