Direct laser writing based on non-linear 3D nanolithography (also known as 3D laser lithography, 3DLL) is a powerful technology to manufacture polymeric micro-optical components. However, practical applications of these elements are limited due to the lack of knowledge of their optical resilience and durability. In this work, we employ 3DLL for the fabrication of bulk (i.e. fully filled) and woodpile structures out of different photopolymers. We then characterize them using S-on-1 laser induced damage threshold (LIDT) measurements. In this way, quantitative data of LIDT values can be collected. Furthermore, this method permits to gather damage morphologies. The results presented in this work demonstrate that LIDT values depend on the material and the geometry of the structure. Bulk non-photosensitized hybrid organic-inorganic photopolymer SZ2080 structures are found to be the most resilient with a damage threshold being of 169±15 mJ/cm².