Preprint Article Version 1 Preserved in Portico This version is not peer-reviewed

Optical Damage Thresholds of Microstructures Made by Laser 3D Nanolithography

Version 1 : Received: 3 October 2019 / Approved: 4 October 2019 / Online: 4 October 2019 (11:56:36 CEST)

How to cite: Butkutė, A.; Čekanavičius, L.; Rimšelis, G.; Gailevičius, D.; Mizeikis, V.; Melninkaitis, A.; Baldacchini, T.; Jonušauskas, L.; Malinauskas, M. Optical Damage Thresholds of Microstructures Made by Laser 3D Nanolithography. Preprints 2019, 2019100052. https://doi.org/10.20944/preprints201910.0052.v1 Butkutė, A.; Čekanavičius, L.; Rimšelis, G.; Gailevičius, D.; Mizeikis, V.; Melninkaitis, A.; Baldacchini, T.; Jonušauskas, L.; Malinauskas, M. Optical Damage Thresholds of Microstructures Made by Laser 3D Nanolithography. Preprints 2019, 2019100052. https://doi.org/10.20944/preprints201910.0052.v1

Abstract

Direct laser writing based on non-linear 3D nanolithography (also known as 3D laser lithography, 3DLL) is a powerful technology to manufacture polymeric micro-optical components. However, practical applications of these elements are limited due to the lack of knowledge of their optical resilience and durability. In this work, we employ 3DLL for the fabrication of bulk (i.e. fully filled) and woodpile structures out of different photopolymers. We then characterize them using S-on-1 laser induced damage threshold (LIDT) measurements. In this way, quantitative data of LIDT values can be collected. Furthermore, this method permits to gather damage morphologies. The results presented in this work demonstrate that LIDT values depend on the material and the geometry of the structure. Bulk non-photosensitized hybrid organic-inorganic photopolymer SZ2080 structures are found to be the most resilient with a damage threshold being of 169±15 mJ/cm2.

Keywords

3D laser lithography; laser induced damage threshold; micro-optics; photonics

Subject

Physical Sciences, Optics and Photonics

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