Version 1
: Received: 23 April 2024 / Approved: 24 April 2024 / Online: 24 April 2024 (14:10:16 CEST)
How to cite:
Xu, M.; Wu, W.; Ke, Y.; Liu, X.; Zhong, Y.; Gao, X. Mechanism of Surface Hydroxylation Acceleration and Laser-Induced Damage Threshold Reduction during Ion Beam Sputtering of Fused Silica. Preprints2024, 2024041607. https://doi.org/10.20944/preprints202404.1607.v1
Xu, M.; Wu, W.; Ke, Y.; Liu, X.; Zhong, Y.; Gao, X. Mechanism of Surface Hydroxylation Acceleration and Laser-Induced Damage Threshold Reduction during Ion Beam Sputtering of Fused Silica. Preprints 2024, 2024041607. https://doi.org/10.20944/preprints202404.1607.v1
Xu, M.; Wu, W.; Ke, Y.; Liu, X.; Zhong, Y.; Gao, X. Mechanism of Surface Hydroxylation Acceleration and Laser-Induced Damage Threshold Reduction during Ion Beam Sputtering of Fused Silica. Preprints2024, 2024041607. https://doi.org/10.20944/preprints202404.1607.v1
APA Style
Xu, M., Wu, W., Ke, Y., Liu, X., Zhong, Y., & Gao, X. (2024). Mechanism of Surface Hydroxylation Acceleration and Laser-Induced Damage Threshold Reduction during Ion Beam Sputtering of Fused Silica. Preprints. https://doi.org/10.20944/preprints202404.1607.v1
Chicago/Turabian Style
Xu, M., Yaoyu Zhong and Xiaopeng Gao. 2024 "Mechanism of Surface Hydroxylation Acceleration and Laser-Induced Damage Threshold Reduction during Ion Beam Sputtering of Fused Silica" Preprints. https://doi.org/10.20944/preprints202404.1607.v1
Abstract
In this paper, the mechanism of combined process of ion beam sputtering (IBS) and HF acid etching on the chemical structure defects of fused silica and its laser damage resistance perfor-mance were investigated. During the removal process of surface material, the sputtering effect causes lattice atoms to detach from their original positions, forming a large number of unsaturated structures on silica surface, which improves the chemical activity of Si and O atoms, accelerates the chemical reaction process between surface atoms and water molecules, increases the content of hydroxyl (OH-) groups in the shallow layer, and enhances the photothermal weak absorption intensity. However, the presence of OH- groups reduces the bonding strength of Si-O, destroys the spatial network structure of silica bulk, and reduces the mechanical strength of silica surface, resulting in a decrease in its laser damage resistance performance. The paper reveals for the first time the mechanism of IBS to change the structure characteristics of silica material, accelerate the surface hydroxylation process, and thereby reduces the laser damage resistance performance. This work provides technical guidance for effectively suppressing chemical structure defects on silica surface and improving laser damage resistance performance of optical components under high-flux laser irradiation.
Keywords
ion beam sputtering; laser damage; hydroxyl groups; surface hydroxylation; chemical structure defect
Subject
Engineering, Mechanical Engineering
Copyright:
This is an open access article distributed under the Creative Commons Attribution License which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited.
