Kaszyca, K.; Chmielewski, M.; Bucholc, B.; Błyskun, P.; Nisar, F.; Rojek, J.; Zybała, R. Using the Spark Plasma Sintering System for Fabrication of Advanced Semiconductor Materials. Materials2024, 17, 1422.
Kaszyca, K.; Chmielewski, M.; Bucholc, B.; Błyskun, P.; Nisar, F.; Rojek, J.; Zybała, R. Using the Spark Plasma Sintering System for Fabrication of Advanced Semiconductor Materials. Materials 2024, 17, 1422.
Kaszyca, K.; Chmielewski, M.; Bucholc, B.; Błyskun, P.; Nisar, F.; Rojek, J.; Zybała, R. Using the Spark Plasma Sintering System for Fabrication of Advanced Semiconductor Materials. Materials2024, 17, 1422.
Kaszyca, K.; Chmielewski, M.; Bucholc, B.; Błyskun, P.; Nisar, F.; Rojek, J.; Zybała, R. Using the Spark Plasma Sintering System for Fabrication of Advanced Semiconductor Materials. Materials 2024, 17, 1422.
Abstract
The interest in the Spark Plasma Sintering (SPS) technique has continuously increased over the last few years. This article shows the possibility of the development of a SPS device used for material processing and synthesis both in both scientific and industrial applications. This work presents an example of processing Arc-Meleted (half-Heusler, cobalt triantimonide) and SHS-synthesized semiconductors (bismuth telluride) materials with SPS device. The system functionalities expansion is presented, showing the possible way of increasing the information amount obtained about SPS processes and using the SPS apparatus for conducting synthesis of materials and increasing reproducibility and accuracy of process parameters control.
Chemistry and Materials Science, Metals, Alloys and Metallurgy
Copyright:
This is an open access article distributed under the Creative Commons Attribution License which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited.
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